Charged Particle Beam System Multi-Aperture Deflection
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Solution Overview
Problem
Conventional charged particle beam systems face challenges in achieving high-resolution and high-throughput imaging due to limitations in forming small primary electron beam spots and rapid scanning across object surfaces.
Innovation Solution
The method involves extracting a particle beam, performing multiple accelerating and decelerating stages, and deflecting beamlets to control their incidence on an object surface, utilizing a configuration of electrodes and deflector systems to generate electric and magnetic fields for precise beam control, allowing for small beam spots and rapid scanning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a plurality of primary electron beamlets is focused in parallel to form beam spots on the object, then imaging capability is provided, but the beam spots are large and scanning speed is limited
Solution Approach 1:
The electron beam is segmented into multiple beamlets through a multi-aperture plate, with each beamlet independently controllable. This segmentation allows parallel processing of multiple beam spots simultaneously, increasing scanning speed while maintaining small spot sizes for high spatial resolution
Solution Approach 2:
The system employs dynamic control of beamlet positions and sizes through adjustable electrodes and deflectors, enabling rapid reconfiguration of the beam pattern. This dynamic capability allows the beam spots to be rapidly scanned across the object surface while maintaining optimal spot size for high resolution imaging
2Measurement precision
If the primary electron beam spots are made small to achieve high resolution, then spatial resolution is improved, but the system complexity increases
Solution Approach 1:
The multi-aperture plate serves multiple functions: it segments the beam into multiple beamlets, defines the initial spot size, and works in conjunction with electrodes to provide independent control of each beamlet. This multi-functionality reduces the need for separate components, managing system complexity while achieving high spatial resolution
Solution Approach 2:
The system controls beamlet parameters (position, size, intensity) by adjusting electrical parameters of electrodes and deflectors. By changing these parameters dynamically, the system achieves small beam spot sizes for high resolution without requiring permanent physical modifications that would increase complexity
3Manufacturing precision
If multiple accelerating and decelerating stages are performed on the beamlets, then beam control precision is improved, but the device complexity increases
Solution Approach 1:
The accelerating and decelerating stages are merged with the beamlet formation and positioning functions. The same electrodes that accelerate the beamlets also control their positioning and focusing, eliminating the need for separate control mechanisms and reducing overall device complexity while maintaining precise beam control
Solution Approach 2:
The multi-aperture plate acts as an intermediary element that works in conjunction with the accelerating and decelerating electrodes. It provides a fixed geometric reference for beamlet formation while the electrodes provide dynamic control, dividing the complexity between static and adjustable components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables high spatial resolution and rapid scanning, reducing Coulomb interactions and preventing surface charging, thereby enhancing image quality and throughput.
Implementation Method 1
performing a first accelerating of the particles of the beam; performing a second accelerating of the particles of the beamlets; performing a first decelerating of the particles of the beamlets; performing a second decelerating of the particles of the beamlets
Implementation Method 2
deflecting the beamlets in a direction oriented transverse to a direction of propagation of the particles of the beamlets
Data Source
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AI summary
A method of operating a charged particle beam system comprises extracting a particle beam from a source; performing a first accelerating of the particles of the beam; performing a second accelerating of the particles of the beam after performing the first accelerating; performing a first decelerating of the particles of the beam after the performing of the second accelerating; forming a plurality of particle beamlets from the beam after the performing of the first decelerating; deflecting the beamlets in a direction oriented transverse to a direction of propagation of the particles of the beamlets; performing a second decelerating of the particles of the beamlets after the deflecting of the beamlets; and allowing the particles of the beamlets to be incident on an object surface after the performing of the second decelerating.