Charged-particle radiation apparatus drift correction
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Solution Overview
Problem
The existing techniques for defect observation in semiconductor production, particularly with scanning electron microscopes, face challenges in optimizing parameters for image drift correction due to varying defect positions and production patterns, leading to suboptimal image quality and increased complexity with smaller semiconductor sizes and more production steps.
Innovation Solution
A charged-particle radiation apparatus with a defect observation device, including a control unit and display unit, executes a drift correction process under multiple conditions and displays the results, allowing users to easily determine optimal parameter settings for image correction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If drift correction is performed under multiple correction conditions to determine optimal parameters, then image quality is improved, but device complexity and operation time increase
Solution Approach 1:
The system automatically executes drift correction under multiple correction conditions and displays the results, allowing the apparatus to serve itself in determining optimal parameters without requiring expert manual configuration. The control unit autonomously manages the correction process and presents comparable results for selection.
Solution Approach 2:
The system pre-executes drift correction under multiple correction conditions before actual defect observation, allowing optimal parameters to be determined in advance. This preliminary action enables selection of the best correction condition without time pressure during production observation.
2Manufacturing precision
If drift correction is performed under multiple correction conditions to determine optimal parameters, then image quality is improved, but operation time increases
Solution Approach 1:
The system performs drift correction under multiple correction conditions as a preliminary step before actual defect observation. By determining optimal parameters in advance through pre-execution of correction processes, the system avoids time-consuming adjustments during production observation.
Solution Approach 2:
The control unit displays multiple drift-corrected images corresponding to different correction conditions, enabling operators to select the optimal condition based on visual feedback. This feedback mechanism allows efficient parameter selection without requiring extensive trial-and-error adjustments.
3Difficulty of detecting and measuring
If defect observation is performed on production steps with image drift, then defect detection capability is improved, but measurement precision deteriorates due to drift
Solution Approach 1:
The system applies drift correction as a preliminary anti-action to counteract the harmful effects of image drift before defect observation. By correcting drift under multiple conditions and selecting the optimal correction, the system prevents measurement precision deterioration while enabling defect detection on production steps that previously could not be observed.
Data Source
AI summary
The present invention provides a charged-particle radiation apparatus with a defect observation device for observing defects on a sample, the apparatus including a control unit and a display unit. The control unit is configured to execute a drift correction process on one or more images acquired with the defect observation device under a plurality of correction conditions, and display the plurality of correction conditions and a plurality of corrected images obtained through execution of the drift correction process in association with each other, as a first screen on the display unit.