Charged Particle Source Automated Tip Formation
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Solution Overview
Problem
Charged particle beam devices, particularly those using gas field ion sources, face challenges in maintaining reliable and automated procedures for maintenance, such as cleaning and rebuilding the emitter tip, which affects their high-resolution performance and operational stability.
Innovation Solution
A charged particle beam device incorporating an emitter unit with a stable voltage supply and a pulsed voltage supply, along with a control unit that measures emitter characteristics and adjusts the pulsed voltage to maintain optimal emission conditions, allowing for automated in situ tip reconditioning and cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a gas field ion source is used to achieve high spatial resolution, then the resolution is improved, but the emitter tip degrades over time requiring manual maintenance
Solution Approach 1:
The system automatically performs emitter tip maintenance by applying voltage pulses to clean and rebuild the tip surface. The control unit monitors emitter characteristics and triggers pulsed voltage application when degradation is detected, enabling the system to maintain itself without manual intervention.
Solution Approach 2:
The system applies periodic voltage pulses to the emitter tip to prevent degradation. These pulses are applied at regular intervals or when degradation thresholds are reached, automatically cleaning and rebuilding the tip surface to maintain emission performance.
2Ease of repair
If manual cleaning and rebuilding procedures are used for emitter maintenance, then the emitter can be restored, but the process is time-consuming and requires user intervention
Solution Approach 1:
The system automatically performs emitter tip maintenance by applying voltage pulses to clean and rebuild the tip surface. The control unit monitors emitter characteristics and triggers pulsed voltage application when degradation is detected, enabling the system to maintain itself without manual intervention.
Solution Approach 2:
The patent replaces manual mechanical cleaning procedures with an electrical field-based pulsed voltage system. Instead of physically cleaning the emitter tip, the system uses controlled electrical pulses to remove contaminants and rebuild the tip surface, significantly reducing maintenance time and eliminating the need for manual intervention.
3Productivity
If pulsed voltage is applied to clean the emitter tip, then emission current is restored, but excessive voltage may damage the emitter
Solution Approach 1:
The control unit continuously monitors emitter characteristics such as emission current and applies pulsed voltage only when degradation thresholds are reached. The system adjusts pulse parameters based on real-time feedback from the emitter state, preventing both under-maintenance and over-maintenance conditions that could damage the emitter.
Solution Approach 2:
The system dynamically adjusts voltage pulse parameters including amplitude, duration, and frequency based on the emitter's degradation state. By changing these parameters adaptively, the system applies sufficient voltage to restore emission current while preventing excessive voltage that could damage the emitter structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables the recovery of degraded emitter tips, maintaining maximum emission current and stability, and extends the life of the emitter by preventing damage through controlled voltage pulses, thus ensuring consistent high-resolution performance.
Implementation Method 1
voltage supply unit adapted for providing a stable voltage to generate a stable extraction field at the emitter tip
Implementation Method 2
pulsed voltage supply member adapted for providing a pulsed voltage to generate a pulsed extraction field on top of the stable extraction field
Data Source
AI summary
A charged particle beam device is described. The device includes an emitter unit including an emitter tip; a voltage supply unit adapted for providing a stable voltage to generate a stable extraction field at the emitter tip; a pulsed voltage supply member adapted for providing a pulsed voltage to generate a pulsed extraction field on top of the stable extraction field; a measuring unit for measuring an emitter characteristic; and a control unit adapted for receiving a signal from the measuring unit and for control of the pulsed voltage supply member.


