Charged Particle Monochromator Layout for Narrow Zero-Loss Peaks

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Solution Overview

Problem

Current charged particle microscopy systems face challenges in achieving a narrow zero-loss peak width at the 1/1000 limit, which affects the energy resolution and signal-to-noise ratio in energy loss spectroscopy, particularly for vibrational EELS, due to coulombic interactions and complex structural requirements.

Innovation Solution

A charged particle optical device is configured with a dispersing element, a selector, and an undispersing element, including Wien filters and electron lenses, with a cutoff opaque to electrons defining an aperture, to output a beam with an energy deviation of less than or equal to 80 meV at the 1/1000 limit, improving energy resolution and reducing coulombic interactions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If traditional alpha-type monochromators are used to achieve narrow zero-loss peak width, then energy resolution is improved, but device complexity and structural requirements increase significantly

Engineering Contradiction:
Improveenergy resolutionVSAvoidstructural complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The monochromator is divided into distinct functional modules: a dispersing element (first Wien filter) that separates electrons by energy, a selector (aperture) that transmits only the desired energy range, and an undispersing element (second Wien filter) that recombines the dispersed beam. This segmentation allows each component to be optimized independently while achieving narrow zero-loss peak width without requiring complex integrated structures.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The dispersed electron beam serves as an intermediary state between the input and output beams. By introducing this intermediate dispersed state and then undispersing it, the system achieves energy selection without requiring direct complex filtering mechanisms. The dispersion and undispersion processes act as mediator steps that simplify the overall structural requirements.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Measurement precision

If monochromation is applied to reduce coulombic interactions, then energy distribution narrows, but device complexity increases

Engineering Contradiction:
Improveenergy distribution widthVSAvoidoperational complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The system changes the energy parameter of electrons through controlled dispersion and undispersion processes. By adjusting the dispersion strength in the first Wien filter and the undispersion strength in the second Wien filter, the system narrows the energy distribution without requiring complex operational mechanisms. The parameter transformation approach simplifies operational complexity compared to traditional methods.

Inventive Principle:
Principle #35Parameter changes

3Measurement precision

If aperture size is reduced to improve energy resolution, then zero-loss peak width decreases, but beam current is reduced

Engineering Contradiction:
Improvezero-loss peak widthVSAvoidbeam current
Core Design Contradiction:
Measurement precisionVSQuantity of substance

Solution Approach 1:

The undispersing element continuously recombines the dispersed electron beam after energy selection, maintaining beam current while preserving the energy resolution achieved by the aperture. This continuous recombination process ensures that electrons across the selected energy range are efficiently collected, preventing beam current loss that would otherwise occur with simple aperture filtering.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution achieves a significantly narrower zero-loss peak width at the 1/1000 limit, enhancing the energy resolution and signal-to-noise ratio for vibrational EELS, while being structurally and operationally less complex than traditional alpha-type monochromators, allowing for higher probe currents without increased complexity.

Implementation Method 1

a dispersing element disposed substantially on a beam axis, the dispersing element being configured to disperse particles of a beam of charged particles by energy in a dispersal plane parallel with the beam axis

Methodology Applied
Scientific EffectElectromagnetic force: Lorentz Force

Implementation Method 2

an undispersing element configured to at least partially undisperse particles of the beam of charged particles by energy in the dispersal plane

Methodology Applied
Scientific EffectElectromagnetic force: Lorentz Force

Implementation Method 3

The cutoff can include a material that is opaque to electrons and defining an aperture substantially aligned with the beam axis

Methodology Applied
Scientific EffectElectron absorption: Absorption (physical)

Data Source

PatentUS20240249905A1Techniques for narrowing zero loss peaks in monochromated charged particles sources
Publication Date: 2024.07.25 FEI CO
  • US20240249905A1 patent drawing
  • US20240249905A1 patent drawing
  • US20240249905A1 patent drawing

AI summary

Charged particle optical devices, systems, and methods are provided. A charged particle optical device can include a dispersing element disposed substantially on a beam axis, the dispersing element being configured to disperse particles of a beam of charged particles by energy in a dispersal plane parallel with the beam axis. The charged particle optical device can include a selector, disposed on the beam axis at a position substantially corresponding to a first crossover plane. The charged particle optical device can include an undispersing element. The charged particle optical device can include a cutoff disposed on the beam axis downstream of the selector at a position substantially corresponding to a second crossover plane on the beam axis. The second crossover plane can be downstream of the first crossover plane. The cutoff can include a material that is opaque to electrons and defining an aperture substantially aligned with the beam axis.