Multi-Device Charging Stand With Segmented Support Baffles
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Solution Overview
Problem
Current charging tools lack space for multiple electronic devices, leading to disorganization and inconvenience when charging multiple devices simultaneously, affecting user experience.
Innovation Solution
A charging stand with a support baffle system comprising multiple baffles and adjustable spacings to accommodate devices of varying sizes and angles, featuring detachable mounting slots and anti-skid features for stability and adaptability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a charging stand is designed to accommodate multiple electronic devices, then the charging capacity increases, but the device complexity and structural complexity increase
Solution Approach 1:
The charging stand is divided into multiple independent support baffles (first support baffle, second support baffle, third support baffle) that can be separately positioned and adjusted. Each baffle acts as an independent segment that can be individually configured to support different devices, allowing the system to handle multiple devices without requiring a completely complex integrated structure.
Solution Approach 2:
The patent introduces a vertical dimension for device placement by using support baffles of different heights (first height, second height, third height) arranged at different vertical levels. This multi-level vertical arrangement allows multiple devices to be charged simultaneously without requiring horizontal expansion, thereby increasing charging capacity while controlling structural complexity.
2Adaptability or versatility
If support baffles of different heights are used to accommodate devices of varying sizes, then the adaptability increases, but the device complexity increases
Solution Approach 1:
Each support baffle is assigned a specific local function with a predetermined height (first support baffle with first height, second support baffle with second height, third support baffle with third height). This local differentiation allows each baffle to be optimized for specific device types or sizes, enhancing adaptability while keeping each individual baffle's design simple and standardized.
Solution Approach 2:
The support baffles are designed with universal mounting capabilities through mounting portions that can attach to different locations on the charging stand main body. This universal mounting design allows the same baffle structure to serve multiple functions and positions, increasing adaptability without requiring unique complex designs for each configuration.
3Ease of operation
If mounting slots are provided for detachable support baffles, then the ease of operation increases, but the device complexity increases
Solution Approach 1:
Mounting slots are pre-provided on the charging stand main body at predetermined positions before the support baffles are installed. This preliminary preparation of mounting locations allows users to easily attach and detach support baffles without requiring complex assembly procedures, thereby improving ease of operation while keeping the mounting mechanism itself simple and standardized.
Data Source
AI summary
A charging stand includes a charging stand main body and a support baffle portion. The support baffle portion includes a first support baffle, a second support baffle and a third support baffle. The first support baffle is connected with the charging stand main body. The second support baffle is connected with the charging stand main body. The third support baffle is connected with the charging stand main body, the third support baffle is located between the first support baffle and the second support baffle, a first charging placement space is formed between the third support baffle and the first support baffle, and a second charging placement space is formed between the third support baffle and the second support baffle. A first spacing is formed between the third support baffle and the first support baffle, a second spacing is formed between the third support baffle and the second support baffle.


