Chemical Liquid Circulation Prep for Bubble-Free Substrate Processing
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Solution Overview
Problem
The existing chemical liquid circulation systems in semiconductor manufacturing fail to effectively remove air bubbles, leading to particle formation and substrate processing failures due to the heating of chemical liquids without considering the temperature of the contact surface, resulting in air bubble formation and subsequent contamination.
Innovation Solution
A method of circulating chemical liquid that includes a chemical liquid circulation preparation step where the recovery line is opened before the supply line to remove air bubbles, utilizing a deaeration unit and multiple chemical liquid circulation portions with controlled valve operations to maintain continuous circulation and prevent air bubble introduction into the supply line.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If chemical liquid is heated without considering the temperature of the contact surface, then the chemical liquid reaches the preset temperature, but air bubbles form in the chemical liquid
Solution Approach 1:
The patent applies preliminary action by opening the recovery line before the supply line to enable air bubbles to be removed from the chemical liquid before it is supplied to the process chamber. This preliminary removal of air bubbles prevents their formation in the supplied chemical liquid, solving the contradiction between heating the chemical liquid to the preset temperature and preventing air bubble formation.
2Productivity
If air bubbles are present in the chemical liquid, then the chemical liquid can be supplied to the process chamber, but particles are formed on the substrate
Solution Approach 1:
The patent applies the extraction principle by removing air bubbles from the chemical liquid through the recovery line before the chemical liquid is supplied to the process chamber. This extraction of harmful air bubbles prevents particle formation on the substrate, thereby maintaining substrate quality while ensuring continuous processing productivity.
3Productivity
If the chemical liquid circulation system operates continuously, then the chemical liquid can be supplied without interruption, but air bubbles accumulate in the system
Solution Approach 1:
The patent applies periodic action by implementing a cyclic operation where the recovery line is opened before the supply line in each circulation cycle. This periodic opening of the recovery line allows air bubbles to be removed at regular intervals, maintaining reliable air bubble-free chemical liquid supply while ensuring continuous operation and productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively removes air bubbles from the chemical liquid, preventing particle formation and ensuring reliable substrate processing by maintaining a bubble-free chemical liquid supply, thus enhancing the quality and yield of semiconductor manufacturing.
Implementation Method 1
A heater may be provided in each line to provide high temperature chemical liquid depending on processes. Generally, a temperature sensor may be provided on a discharge end of the heater. Based on the temperature of the chemical liquid measured by the temperature sensor, the chemical liquid may be heated to a preset temperature.
Implementation Method 2
a chemical liquid circulation preparation step of removing air bubbles in chemical liquid recovered to the chemical liquid recovery line by opening the chemical liquid recovery line before the chemical liquid supply line is opened
Data Source
AI summary
A method of circulating chemical liquid includes a chemical liquid circulation step of circulating chemical liquid through a chemical liquid supply line and a chemical liquid recovery line installed in a tank of a chemical liquid circulation portion; and a chemical liquid circulation preparation step of removing air bubbles in chemical liquid recovered to the chemical liquid recovery line by opening the chemical liquid recovery line before the chemical liquid supply line is opened, before the chemical liquid circulation step.