Chemical Liquid for Semiconductor Manufacturing with Controlled Charge Potential
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Solution Overview
Problem
Existing chemical solutions for semiconductor manufacturing, such as photoresist composition treatments, face challenges in defect inhibition and pipe line breakage during the manufacturing process, particularly due to charging issues when flowing through transfer pipelines made of resin materials.
Innovation Solution
A chemical liquid comprising an organic solvent and specific ions like Fe, Cr, and Ni, with controlled charge potential and particle content, stored in containers with metallic contact surfaces of stainless steel, is developed to enhance defect inhibition and prevent pipe line breakage. The manufacturing method involves filtering and storing the liquid under controlled temperature conditions to minimize impurities and charging.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the chemical liquid contains low concentrations of metal ions (0.1 to 100 mass ppt) and controlled organic impurities, then defect inhibition performance is improved, but pipe line breakage occurs during manufacturing
Solution Approach 1:
The patent precisely controls the concentrations of metal ions (Fe, Cr, Ni, Pb) within 0.1 to 100 mass ppt and organic impurities within 1 to 5,000 mass ppm ranges. By optimizing these parameter ranges, the chemical liquid achieves low charge potential (≤100 mV) which prevents pipe line breakage while maintaining excellent defect inhibition performance in semiconductor manufacturing
Solution Approach 2:
The patent converts potentially harmful metal ions and organic impurities into beneficial components by controlling them within specific concentration ranges. These controlled impurities help reduce the charge potential to 100 mV or lower, transforming what would normally be harmful contaminants into elements that prevent electrostatic damage to semiconductor devices and pipe line breakage
2Object-generated harmful factors
If the charge potential is reduced to 100 mV or lower, then pipe line breakage is inhibited, but defect inhibition performance may be compromised
Solution Approach 1:
The patent simultaneously optimizes multiple parameters: metal ion concentrations (0.1 to 100 mass ppt), organic impurity content (1 to 5,000 mass ppm), and charge potential (≤100 mV). This multi-parameter optimization ensures that reducing charge potential to prevent pipe line breakage does not compromise defect inhibition performance, as both requirements are satisfied within the specified ranges
Solution Approach 2:
The chemical liquid comprises a composite formulation containing organic solvents, specifically controlled metal ions (Fe, Cr, Ni, Pb), and organic impurities. This composite structure allows the liquid to exhibit both low charge potential (≤100 mV) for pipe line safety and effective defect inhibition properties, achieving dual functionality through careful composition design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively inhibits defects on semiconductor substrates and reduces pipe line breakage by maintaining a low charge potential and controlled impurity levels, ensuring improved manufacturing efficiency and equipment integrity.
Implementation Method 1
a charge potential of the chemical liquid is equal to or lower than 100 mV
Implementation Method 2
The manufacturing method involves filtering and storing the liquid under controlled temperature conditions to minimize impurities and charging
Data Source
AI summary
An object of the present invention is to provide a chemical liquid which has excellent defect inhibition performance and hardly breaks a transfer pipe line that a device for manufacturing the chemical liquid includes at the time of manufacturing the chemical liquid. Another object of the present invention is to provide a chemical liquid storage body, a manufacturing method of a chemical liquid, and a manufacturing method of a chemical liquid storage body. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an organic solvent and an ion of at least one kind of atom selected from the group consisting of an Fe atom, a Cr atom, a Ni atom, and a Pb atom, in which in a case where the chemical liquid contains one kind of the ion, a content of the metal ion is 0.1 to 100 mass ppt, in a case where the chemical liquid contains two or more kinds of the ions, a content of each of the metal ions is 0.1 to 100 mass ppt, and a charge potential is equal to or lower than 100 mV.