Multi-Stage Chemical Purification for Semiconductor-Grade Purity
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The challenge lies in developing a cost-effective, energy-efficient, and high-purity production process for general-purpose high-purity/ultra-high-purity chemicals, particularly for the semiconductor industry, as current methods struggle to meet the stringent purity and cleanliness requirements of integrated circuit manufacturing, with limited domestic capabilities in China.
Innovation Solution
A production system comprising a raw material tank, adsorption system, crystallizer, distillation towers, vapor permeation device, and membrane separation system, utilizing advanced adsorbents, multi-stage crystallization, specialized distillation techniques, and membrane separation to remove impurities, ensuring high purity and quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional production methods are used, then production cost is reduced, but product purity and quality cannot meet semiconductor industry standards
Solution Approach 1:
The production process is divided into multiple sequential purification stages: adsorption system (first and second adsorption devices), crystallization system, multiple distillation towers (light and heavy impurity removal), vapor permeation device, and membrane separation system. Each stage targets specific impurities, progressively achieving ultra-high purity suitable for semiconductor applications.
Solution Approach 2:
Different purification methods are applied at different stages based on the specific impurities present: adsorption for initial contamination removal, crystallization for bulk purification, distillation for volatile impurity separation, vapor permeation for trace water removal, and membrane separation for final ultra-purity achievement. Each subsystem is optimized for its specific function.
2Loss of energy
If conventional production methods are used, then energy consumption is high, but production efficiency is maintained
Solution Approach 1:
The system operates as a continuous production line where materials flow sequentially through adsorption, crystallization, distillation, vapor permeation, and membrane separation without interruption. This continuous operation eliminates repeated heating and cooling cycles, significantly reducing energy consumption while maintaining high production efficiency.
Solution Approach 2:
Multiple purification functions are merged into a single integrated production line, combining adsorption, crystallization, distillation, vapor permeation, and membrane separation in one continuous process. This eliminates the need for separate batch operations and reduces cumulative energy consumption.
3Manufacturing precision
If simple purification processes are used, then production cost is low, but impurity removal effectiveness is insufficient
Solution Approach 1:
The purification process is segmented into five distinct functional subsystems, each targeting specific types of impurities: adsorption for organic contaminants, crystallization for bulk purification, distillation for volatile impurities, vapor permeation for trace water, and membrane separation for ultra-trace contaminants. This segmentation makes the complex process manageable and optimizable.
Solution Approach 2:
The production system is designed as a universal platform that can process various chemical materials to achieve ultra-high purity. The same basic architecture (adsorption-crystallization-distillation-vapor permeation-membrane separation) can be applied to different feedstocks and target products, making the complexity reusable across applications.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system produces high-purity/ultra-high-purity chemicals suitable for integrated circuit manufacturing, achieving energy savings and meeting high-end semiconductor industry standards while utilizing diverse chemical sources and reducing utility consumption.
Implementation Method 1
chemical raw materials from different sources are sent to a first adsorption device to remove water, hydrocarbon bonds, hydrogen oxygen bonds and trace impurities
Implementation Method 2
The materials after removal are sent to a crystallizer for separation and purification through continuous multi-stage countercurrent stepwise crystallization or recrystallization
Implementation Method 3
Subsequently, further separation and purification are carried out by distillation to remove the light impurities and heavy impurities
Implementation Method 4
Finally, water and other impurities are deeply removed by the vapor permeation device
Implementation Method 5
Finally, trace solid particles, metal ions and other impurities are removed by membrane separation
Data Source
AI summary
A production system, production method and application of general-purpose high-purity chemicals are disclosed. The production system includes a raw material tank, and an adsorption system, a crystallizer, a first light-impurity removal tower, a first heavy-impurity removal tower, a second light-impurity removal tower, a motorized tower, a second heavy-impurity removal tower, a vapor permeation device, a membrane separation system and a filling system connected with the raw material tank in sequence. The high-purity chemicals produced by the above system have high purity and excellent quality. Compared with the prior art, the system and method designed by the present disclosure have more pertinence, integrity, progressiveness, energy-saving, precision, high safety coefficient and great industrial promotion value. And the products produced are of excellent quality, which can meet the standards applied to the manufacturing of integrated circuit electronic components and meet the high-end needs of the semiconductor industry market.


