Chemical Rinse Composition for Magnetic Particle Defect Removal
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Solution Overview
Problem
Magnetic particles used in pattern-forming compositions often remain on the substrate surface after rinsing, causing defects due to their high specific gravity and poor dispersibility in water, which is exacerbated by miniaturization of electronic devices requiring improved defect removability.
Innovation Solution
A chemical liquid comprising water, a surfactant with a water-soluble polymer, and a water-soluble organic solvent is used as a rinse liquid after alkaline development, enhancing the removability of magnetic particles by facilitating their dispersion and removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If water rinsing is used to remove magnetic particles, then the rinsing process is simple, but magnetic particles remain on the substrate surface causing defects
Solution Approach 1:
The patent changes the chemical parameters of the rinsing liquid by adding surfactants and organic solvents to water, transforming it from a simple aqueous solution to a specialized chemical liquid that can effectively disperse and remove magnetic particles while maintaining process simplicity
Solution Approach 2:
The surfactant acts as an intermediary substance between water and magnetic particles, reducing surface tension and enabling water to effectively wet and remove the hydrophobic magnetic particles from the substrate surface
2Productivity
If magnetic particles are used in pattern-forming composition, then miniaturization and high performance are achieved, but particles with high specific gravity are difficult to remove
Solution Approach 1:
The patent changes the density and surface tension parameters of the rinsing liquid by adding organic solvents and surfactants, creating a liquid with optimized physical properties that can effectively lift and disperse high-specific-gravity magnetic particles
Solution Approach 2:
The rinsing liquid is formulated as a composite solution containing water, surfactants, and organic solvents, combining the benefits of each component to achieve effective removal of magnetic particles while maintaining compatibility with the pattern-forming process
3Productivity
If pattern miniaturization is pursued, then electronic device performance is enhanced, but defect removability becomes more severe
Solution Approach 1:
The patent optimizes the chemical parameters of the rinsing liquid to match the requirements of miniaturized patterns, using surfactants and organic solvents to achieve precise control over particle removal without damaging fine pattern structures
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The chemical liquid effectively reduces the number of defects on patterned substrates by wrapping and redispersing residual magnetic particles, improving substrate cleanliness and reducing accumulation in development equipment.
Implementation Method 1
the surfactant includes a water-soluble polymer
Implementation Method 2
a water-soluble organic solvent
Data Source
AI summary
A first object of the present invention is to provide a chemical liquid that is excellent in removability of a defect on a patterned substrate including a substrate and a pattern containing magnetic particles. Further, a second object of the present invention is to provide a pattern forming method using the chemical liquid.The chemical liquid of the present invention is a chemical liquid used in forming a pattern and contains magnetic particles, the chemical liquid comprising water, a surfactant, and a water-soluble organic solvent, in which the surfactant includes a water-soluble polymer.