Semiconductor Chip Contact Layout for Uniform Current Injection

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Solution Overview

Problem

Existing optoelectronic semiconductor chips face inefficiencies due to uneven current intensity distribution, leading to localized hotspots and reduced radiative recombination efficiency, which affects their operational performance and lifespan.

Innovation Solution

The design incorporates an x-contact region with distinct first and second regions of varying electrical conductivity, strategically arranged to inject more charge carriers into the x-doped region via the second region, ensuring a more uniform current distribution and compensating for the lower conductivity in the y-doped region, thereby enhancing the chip's operational efficiency and reducing localized current intensities.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If conventional uniform contact regions are used, then manufacturing is simple, but current intensity distribution becomes uneven causing localized hotspots and reduced efficiency

Engineering Contradiction:
Improveradiative recombination efficiencyVSAvoidcontact region structure
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The contact region is divided into first and second regions with different electrical conductivities. The first region has higher electrical conductivity than the second region, creating local quality variations that optimize current distribution. This resolves the contradiction by making different parts of the contact region serve different functions: the first region handles high current density while the second region provides controlled current injection, thereby improving radiative recombination efficiency without requiring complete structural redesign.

Inventive Principle:
Principle #3Local quality

2Power

If higher operating currents are used to improve performance, then output increases, but localized heating increases reducing lifespan

Engineering Contradiction:
Improveoperating currentVSAvoidlocalized heating
Core Design Contradiction:
PowerVSTemperature

Solution Approach 1:

The electrical conductivity parameter is varied across different regions of the contact structure. The first region maintains high electrical conductivity for overall current handling, while the second region has reduced electrical conductivity to control and distribute current injection. This parameter change enables the device to operate at higher power levels by distributing current more evenly, thereby reducing localized heating and extending lifespan.

Inventive Principle:
Principle #35Parameter changes

3Loss of energy

If current is concentrated in specific areas to increase radiative recombination, then efficiency improves, but localized hotspots form reducing reliability

Engineering Contradiction:
Improveradiative recombination efficiencyVSAvoidchip lifespan
Core Design Contradiction:
Loss of energyVSReliability

Solution Approach 1:

The contact region is segmented into multiple functional zones: a first region with higher electrical conductivity and a second region with lower electrical conductivity. This segmentation allows different parts of the contact region to contribute differently to current distribution. The first region provides efficient current injection for radiative recombination while the second region acts as a current-spreading zone that prevents hotspot formation, thereby simultaneously improving efficiency and reliability.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach achieves a more uniform current distribution, increasing the efficiency of radiative recombination, allowing the chip to operate at higher currents with reduced localized heating, thus improving the chip's performance and extending its lifespan.

Implementation Method 1

The x-contact region may comprise a semiconductor material at least in places. The x-contact region may be at least in places doped with at least one x-dopant. The x-contact region is designed such that, during operation of the optoelectronic semiconductor chip, more charge carriers are injected into the x-doped region via the second region than via the first region

Methodology Applied
Scientific EffectElectrical conduction: Conduction (electrical)

Implementation Method 2

The active region may be designed to emit and/or detect electromagnetic radiation during operation of the optoelectronic semiconductor chip. The active region may comprise at least one quantum well structure.

Methodology Applied
Scientific EffectRadiative recombination: Electroluminescence

Data Source

PatentUS12027645B2Optoelectronic semiconductor chip and method for producing an optoelectronic semiconductor chip
Publication Date: 2024.07.02 OSRAM OPTO SEMICON GMBH & CO OHG
  • US12027645B2 patent drawing
  • US12027645B2 patent drawing
  • US12027645B2 patent drawing

AI summary

An optoelectronic semiconductor chip may have or include an x-doped region, a y-doped region, an active region arranged between the x-doped region and the y-doped region, and an x-contact region. The x-contact region may be arranged to the side of the x-doped region facing away from the active region. The x-contact region may include at least one first region and at least one second region. The x-contact region may be designed such that, during operation of the optoelectronic semiconductor chip, more charge carriers are injected into the x-doped region via the second region than via the first region.