Chip Package Protection Layer for Nickel Oxidation During Deflux
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing semiconductor chip packaging technologies face challenges in protecting the nickel-containing layer from deflux solutions during the removal of flux layers, leading to potential migration and oxidation of nickel atoms, which affects the adhesion and integrity of conductive bumps.
Innovation Solution
A conductive protection layer made of a denser material, such as tin or its alloy, is formed over the nickel-containing layer to prevent contact with deflux solutions, and an intermetallic compound layer is formed during a reflow process to enhance adhesion, thereby strengthening the connection between pads and conductive bumps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the nickel-containing layer is directly exposed to deflux solutions during flux layer removal, then the deflux solution can effectively remove flux, but the nickel atoms migrate and oxidize, reducing adhesion and integrity of conductive bumps
Solution Approach 1:
A conductive protection layer made of tin or its alloy is introduced as an intermediary between the nickel-containing layer and the deflux solution. This protection layer prevents direct contact between the nickel and the deflux solution, thereby preventing nickel migration and oxidation while still allowing the deflux solution to remove the flux layer effectively.
Solution Approach 2:
The conductive protection layer is formed over the nickel-containing layer before the deflux solution is applied. This preliminary protective action ensures that the nickel layer is already shielded when the deflux process begins, preventing any potential nickel migration or oxidation during flux removal.
2Reliability
If a conductive protection layer is formed over the nickel-containing layer, then nickel migration and oxidation are prevented, but an additional manufacturing step is required
Solution Approach 1:
The conductive protection layer is formed using the same electroplating process that is already used to form the conductive bumps. By merging the protection layer formation with the existing electroplating step, the patent adds necessary protection without significantly increasing manufacturing complexity or requiring entirely new process equipment.
3Strength
If an intermetallic compound layer is formed during reflow process, then adhesion between pads and conductive bumps is enhanced, but the reflow process temperature and time must be precisely controlled
Solution Approach 1:
The reflow process parameters (temperature and time) are specifically optimized to control the formation of the intermetallic compound layer. By carefully adjusting these parameters, the patent ensures that the intermetallic layer forms with the right thickness and properties to enhance adhesion, while avoiding excessive growth that could cause brittleness or other defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The conductive protection layer and intermetallic compound layer effectively shield the nickel-containing layer from deflux solutions, improving the adhesion and yield of the chip bonding process by preventing nickel migration and oxidation, thus enhancing the reliability of the chip package structure.
Implementation Method 1
A conductive protection layer made of a denser material, such as tin or its alloy, is formed over the nickel-containing layer to prevent contact with deflux solutions
Implementation Method 2
an intermetallic compound layer is formed during a reflow process to enhance adhesion, thereby strengthening the connection between pads and conductive bumps
Data Source
AI summary
A chip package structure is provided. The chip package structure includes. The chip package structure includes a first wiring substrate including a substrate, a first pad, a second pad, and an insulating layer. The chip package structure includes a chip bonded to the second pad. The chip package structure includes a nickel-containing layer under the first pad. The chip package structure includes. a conductive protection layer under the nickel-containing layer. The conductive protection layer has a curved bottom surface, the curved bottom surface is higher than a bottom surface of the insulating layer, and the curved bottom surface and the bottom surface face away from the substrate.


