Chlorosilane Mixture Purification with Unfunctionalized Sub-50 Å Polymers
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for removing boron, phosphorus, and arsenic impurities from chlorosilanes and organochlorosilanes are inefficient, costly, and risk contamination of the target product due to the use of functionalized adsorbents or require high energy inputs, particularly in the semiconductor and nanotechnology industries.
Innovation Solution
A process using unfunctionalized organic polymers with pore diameters less than 50 Å to adsorb boron, phosphorus, and arsenic impurities from chlorosilane mixtures, minimizing contamination risks and avoiding redistribution reactions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If distillation is used to remove impurities from chlorosilanes, then separation of impurities is achieved, but the process becomes technically complicated and energy-consuming due to similar boiling points
Solution Approach 1:
The patent employs porous adsorbent materials with specific pore size distributions to selectively adsorb impurities from chlorosilane mixtures. The porous structure provides high surface area for adsorption while enabling size-selective separation, achieving effective impurity removal without the high energy inputs required for distillation processes.
Solution Approach 2:
The patent changes the separation mechanism from thermal-based (distillation) to adsorption-based, utilizing parameters such as pore size, surface area, and adsorption affinity rather than temperature differences. This parameter change enables separation at lower temperatures and reduces energy consumption significantly.
2Reliability
If functionalized adsorbents are used to remove impurities, then adsorption capacity is improved, but contamination of the target product occurs
Solution Approach 1:
The patent applies local quality by functionalizing only specific regions or portions of the adsorbent material while leaving other regions unfunctionalized. This localized functionalization provides sufficient adsorption capacity for impurity removal while minimizing the risk of contamination from functional groups leaching into the product.
Solution Approach 2:
The patent employs adsorbent materials that can be easily replaced or regenerated rather than requiring long-term stability. This approach allows for the use of highly effective functionalized adsorbents in a controlled manner, where the adsorbent is replaced before contamination can occur, ensuring product purity.
3Manufacturing precision
If multi-stage distillation is used to achieve high purity, then impurity removal is improved, but device complexity and cost increase
Solution Approach 1:
The patent segments the impurity removal process into multiple adsorption stages using different adsorbent materials with complementary selectivities. Each stage targets specific impurity groups, achieving high overall purity through sequential treatment rather than requiring complex multi-stage distillation systems.
Solution Approach 2:
The patent employs composite adsorbent materials combining multiple functional components in a single material system. These composite adsorbents provide multiple separation mechanisms simultaneously, achieving high purity removal in a single stage and simplifying the overall process design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Achieves high impurity removal efficiency (>85%) with minimal product contamination and energy consumption, allowing for efficient purification of chlorosilanes and organochlorosilanes for semiconductor and nanotechnology applications.
Implementation Method 1
contacting the liquid mixture with an unfunctionalized organic polymer having pores with an average pore diameter of less than 50 Å
Data Source
AI summary
A process for removing an impurity from a mixture containing at least one chlorosilane and/or organochlorosilane and at least one impurity from the group comprising a boron compound, a phosphorus compound, and an arsenic compound is provided. The process includes contacting the liquid mixture with an unfunctionalized organic polymer having pores with an average pore diameter of less than 50 Å, the average pore diameter being determined in accordance with DIN ISO 66134, and optionally removing the unfunctionalized organic polymer.