Chromium-Iron Display Substrate Surface Composition

The patent applies local quality by creating a dual-layer oxide structure where the lower layer (first oxide layer) provides corrosion protection and the upper layer (second oxide layer) serves as a photosensitive layer for precise pattern formation. Each layer has different thickness and composition characteristics optimized for its specific function, resolving the contradiction between corrosion resistance and manufacturing precision.

The patent uses composite materials by forming a composite oxide structure with two distinct layers having different properties. The first oxide layer contains higher metal content for corrosion resistance, while the second oxide layer has lower metal content and higher oxygen content for photosensitivity. This composite structure allows simultaneous achievement of both corrosion protection and precise pattern formation.

The patent applies segmentation by dividing the substrate into multiple functional layers including the base substrate, first oxide layer, and second oxide layer. This segmentation allows each layer to perform its specific function - the base substrate provides mechanical strength while the oxide layers provide corrosion protection and pattern formation capability, thereby managing complexity through functional separation.

The patent applies preliminary action by pre-forming the dual-layer oxide structure on the substrate before the photolithography process. This preliminary preparation ensures that when patterns are later formed, the substrate already has optimized stress distribution and corrosion protection, preventing cracks and deformations during subsequent processing and use.

The patent applies local quality by creating distinct regions with different oxide layer characteristics. The lower oxide layer maintains high metal content for strong adhesion and corrosion resistance, while the upper oxide layer has reduced metal content and increased oxygen content to enhance photosensitivity and etchability, thereby enabling pattern formation without compromising adhesion.

The patent applies preliminary action by pre-forming the optimized dual-layer oxide structure before photolithography. The second oxide layer is specifically designed with lower metal content to facilitate controlled etching and pattern formation, while the first oxide layer remains intact to maintain adhesion, thus preparing the substrate in advance for successful patterning without adhesion deterioration.