Variable Impedance Chuck Circuit for Harmonic Plasma Control
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Solution Overview
Problem
Existing substrate processing devices face challenges in uniformly controlling plasma concentration due to harmonic waves formed by alternating current power, leading to non-uniform plasma distribution on substrates.
Innovation Solution
Incorporation of a variable impedance element and a controller to adjust impedance values and direct current power magnitude, allowing precise control over harmonic waves and plasma distribution by using a substrate processing device with multiple chuck electrodes and power sources.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If alternating current power is supplied to control plasma generation, then plasma concentration can be controlled, but harmonic waves are formed causing non-uniform plasma distribution
Solution Approach 1:
The patent applies parameter changes by adjusting the impedance of the chuck electrode to control the amplitude and distribution of harmonic waves. By varying the impedance parameter, the system can suppress unwanted harmonic components and achieve uniform plasma concentration across the substrate while maintaining effective plasma generation through alternating current power.
2Power
If alternating current power is used to generate plasma, then plasma generation is enabled, but harmonic waves cause difficulty in uniform control
Solution Approach 1:
The patent implements feedback control by monitoring the plasma conditions and adjusting the chuck electrode impedance dynamically. The controller modifies the impedance based on detected plasma characteristics, creating a closed-loop system that automatically compensates for non-uniformities caused by harmonic waves, thereby simplifying the operation and achieving uniform plasma distribution.
3Manufacturing precision
If multiple chuck electrodes and variable impedance circuit are added, then harmonic wave control is improved, but device complexity increases
Solution Approach 1:
The patent applies universality by designing the chuck electrode structure to serve multiple functions: it acts as both the substrate support electrode and the harmonic wave control element. The variable impedance circuit is integrated into the existing power supply system, allowing the same hardware components to perform both substrate clamping and plasma uniformity control, thereby reducing overall device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively controls harmonic waves, ensuring uniform plasma concentration and distribution across the substrate, enhancing process consistency and quality.
Implementation Method 1
a variable impedance circuit configured to provide a first electrical signal to the first chuck electrode based on the variable direct current power... variably adjust any one or any combination of a first impedance value of the variable impedance circuit with respect to the first chuck electrode
Implementation Method 2
an electrostatic chuck provided in the chamber body, the electrostatic chuck including a plasma electrode and a first chuck electrode provided over the plasma electrode
Implementation Method 3
Alternating current power having various frequencies may be supplied to a substrate processing device to control the generation of plasma
Data Source
AI summary
A substrate processing device is provided. The substrate processing device includes: a chamber body; an electrostatic chuck provided in the chamber body, the electrostatic chuck including a plasma electrode and a first chuck electrode; a first power source configured to supply alternating current power to the plasma electrode; a second power source configured to generate variable direct current power; a variable impedance circuit configured to provide a first electrical signal to the first chuck electrode based on the variable direct current power; and a controller connected with the second power source and the variable impedance circuit. The controller is configured to variably adjust a first impedance value of the variable impedance circuit with respect to the first chuck electrode and a magnitude of the variable direct current power to control a plurality of harmonic waves formed over the electrostatic chuck by the alternating current power.