Electrostatic Chuck Lift Pin Interface for Arcing Suppression

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Solution Overview

Problem

In plasma processing chambers, electrostatic chucks experience gas breakdown and arcing due to high electric field generation in lift pin holes, and process gas chemistry can infiltrate these holes, degrading bond layers.

Innovation Solution

The design includes a dielectric plate with a protrusion extending into an opening in a conductive plate, and a lift pin guide with features that overlap with the protrusion, creating a torturous path for lift pins to increase the distance from the substrate to conductive portions, thus reducing the risk of arcing and chemical infiltration.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If lift pin holes are formed through the electrostatic chuck to accommodate lift pins, then substrates can be raised and lowered onto the support surface, but gas breakdown and arcing occur due to high electric field generation in the lift pin holes

Engineering Contradiction:
Improvesubstrate loading and unloadingVSAvoidarcing prevention
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

A dielectric protrusion is introduced as an intermediary element between the conductive plate and the lift pin opening. This protrusion extends into the opening and creates a torturous path that prevents direct electric field lines from forming between the substrate and conductive plate, thereby eliminating arcing while preserving lift pin functionality

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The solution adds a vertical dimension to the electric field path by extending the dielectric protrusion upward into the opening. This creates a three-dimensional torturous path that the electric field must navigate, preventing direct arcing paths while maintaining the functional opening for lift pins

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Ease of operation

If lift pin holes are formed through the electrostatic chuck, then lift pins can access substrates, but process gas chemistry infiltrates the holes and degrades bond layers

Engineering Contradiction:
Improvesubstrate handlingVSAvoidbond layer integrity
Core Design Contradiction:
Ease of operationVSStability of the object's composition

Solution Approach 1:

The dielectric protrusion serves as a protective intermediary that blocks process gas chemistry from directly contacting and degrading the bond layer at the interface between the conductive plate and dielectric plate, while still allowing lift pin mechanical access

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The opening is segmented into multiple regions by the dielectric protrusion, creating a torturous path that separates the lift pin access function from the bond layer protection function, allowing each to operate independently

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS20250167030A1Lift pin interface in a substrate support
Publication Date: 2025.05.22 APPLIED MATERIALS INC
  • US20250167030A1 patent drawing
  • US20250167030A1 patent drawing
  • US20250167030A1 patent drawing

AI summary

Methods and apparatus for lift pin interfaces for electrostatic chucks are provided herein. In some embodiments, a lift pin interface in an electrostatic chuck includes: a dielectric plate having a support surface for a substrate; a conductive plate disposed beneath the dielectric plate and having an opening formed therethrough, wherein the dielectric plate includes a protrusion extending into the opening in the conductive plate; and a lift pin guide disposed in the opening, wherein the lift pin guide includes one or more features that extend from an upper surface of the lift pin guide and that overlap with the protrusion of the dielectric plate.