Electrostatic Chuck Shield Electrodes for Lithography

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Solution Overview

Problem

The degradation of channels and external apparatus in contact with temperature conditioning fluid in lithographic chucks over time, and the difficulty in compensating for sudden changes in dissipated power during unmounting and mounting of patterning devices or substrates, lead to temperature fluctuations and performance issues in lithographic apparatuses.

Innovation Solution

Incorporating shield electrodes connected to ground to reduce electrolysis effects, and using compensating electrodes to maintain consistent electric fields and power dissipation, along with a channel heater to manage temperature gradients, within the chuck's temperature conditioning fluid channels.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If temperature conditioning fluid is used to control chuck temperature, then temperature stability is improved, but channel degradation occurs over time

Engineering Contradiction:
Improvetemperature stabilityVSAvoidchannel durability
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

A shield electrode is introduced as an intermediary component between the drive electrode and the temperature conditioning fluid channels. This shield electrode, connected to ground, prevents direct electrical interaction between the high-voltage drive electrode and the fluid channels, thereby preventing electrolysis and degradation of the channels while allowing the temperature conditioning function to continue operating effectively.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Force

If electrostatic clamping is used to hold patterning device, then holding force is improved, but sudden power changes cause temperature fluctuations

Engineering Contradiction:
Improveholding forceVSAvoidtemperature stability
Core Design Contradiction:
ForceVSTemperature

Solution Approach 1:

Compensating electrodes are pre-configured in the chuck structure and connected to a power supply that can provide compensating current. When the drive electrode power is suddenly changed during unmounting or mounting operations, the compensating electrodes automatically provide compensating current to maintain stable power dissipation and temperature, preventing temperature fluctuations caused by the sudden power changes.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The compensating electrodes work as a feedback mechanism to counteract sudden power changes. The power supply monitors the drive electrode power and automatically adjusts the compensating electrode power to maintain constant total power dissipation, thereby stabilizing the chuck temperature during dynamic operations like unmounting and mounting patterning devices.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Prevents degradation of chuck components, maintains stable temperature control, and improves the accuracy of thermo-mechanical corrections, enhancing the performance and overlay precision of lithographic apparatuses.

Implementation Method 1

shield electrodes connected to ground to reduce electrolysis effects

Methodology Applied
Scientific EffectElectrolysis: Electrolysis

Implementation Method 2

channel heater to manage temperature gradients

Methodology Applied
Scientific EffectJoule heating: Joule Heating

Implementation Method 3

The chuck may be configured to hold the patterning device or substrate by electrostatic attraction

Methodology Applied
Scientific EffectElectrostatic attraction: Electrostatics

Implementation Method 4

driving a temperature conditioning fluid through channels formed within the chuck

Methodology Applied
Scientific EffectConvection: Convection

Implementation Method 5

channels formed within the chuck

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Data Source

PatentEP2764408B1Chuck, lithography apparatus and method of using a chuck
Publication Date: 2019.08.21 ASML NETHERLANDS BV
  • EP2764408B1 patent drawingFigure 1~2
  • EP2764408B1 patent drawingFigure 3~4
  • EP2764408B1 patent drawingFigure 5~6

AI summary

A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.