Circuit Layout Generation Using Design Model Parameters
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Solution Overview
Problem
The challenge in integrated circuit manufacturing is optimizing exposure and processing conditions in a timely manner, especially with increasing density, as existing methods require frequent changes to design specifications, leading to prolonged development periods due to the need for repeated processes.
Innovation Solution
A computer-based method and apparatus for integrated circuit design support that includes a memory design model with parameters for active and passive elements and interconnection patterns, allowing for automatic generation and optimization of circuit layouts, exposure conditions, and processing conditions based on input parameters, enabling rapid determination of optimal specifications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If design specifications are changed to optimize exposure and processing conditions, then optimal manufacturing conditions can be achieved, but the development period is prolonged due to repeated processes
Solution Approach 1:
The patent performs preliminary actions by automatically generating circuit layouts and determining exposure conditions before final manufacturing. The system pre-calculates multiple design specifications and their corresponding exposure conditions, allowing the manufacturing process to proceed more efficiently without repeated backtracking and revisions during production.
Solution Approach 2:
The patent implements feedback mechanisms where exposure conditions are determined based on circuit layout characteristics, and processing conditions are adjusted according to exposure results. This closed-loop feedback system enables continuous optimization of manufacturing parameters without requiring complete redesign of the circuit layout, thereby reducing development time while maintaining optimality.
2Manufacturing precision
If repeated processes are performed to match optimal exposure and processing conditions, then manufacturing precision is improved, but the design and manufacturing cycle is extended
Solution Approach 1:
The patent creates virtual copies of the manufacturing process through computer-based simulation and automatic layout generation. Instead of physically repeatedly performing manufacturing processes to find optimal conditions, the system generates multiple virtual design specifications and their corresponding exposure conditions, allowing precise determination of optimal parameters without physical repetition and thereby maintaining high productivity.
Solution Approach 2:
The patent systematically changes design specification parameters to generate different circuit layouts and their corresponding exposure conditions. By automatically adjusting parameters such as feature size, spacing, and pattern density, the system determines optimal exposure and processing conditions through parameter optimization rather than repeated physical processes, thus improving manufacturing precision without extending the design cycle.
Data Source
AI summary
According to one embodiment, a method is disclosed for designing an integrated circuit by a computer including an input unit, a memory unit, a calculating unit, and an output unit. The method can include storing a design model in the memory unit. The design model has parameters of physical quantities of active elements, passive elements, and an interconnection pattern included in the integrated circuit. The design model has an algorithm generating a circuit layout from values of the parameters. The method can include inputting the values of the parameters based on a first design specification of the integrated circuit by the input unit, generating a first circuit layout of the active elements, the passive elements, and the interconnection pattern by the calculating unit using the design model from the values of the parameters received by the input unit, and outputting the first circuit layout by the output unit.