Circuit Line Delay Measurement Using Charged Particle Beams

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing methods for measuring circuit delay in integrated circuits are limited to late-stage testing, which is not sufficient for early detection of manufacturing defects, and can cause mechanical stress and yield loss.

Innovation Solution

A contactless method using charged particle beams, such as electron beams, to measure delay time by varying pulse repetition frequency and observing secondary charged particle emission, allowing for early detection of circuit delays.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional contact-based testing methods are used for delay measurement, then measurement can be performed, but mechanical stress is applied and yield loss occurs

Engineering Contradiction:
Improvedelay measurement capabilityVSAvoidmechanical stress and yield loss
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The patent replaces mechanical contact-based testing with a non-contact charged particle beam method. The charged particle beam (electrons or ions) interacts with the conductive line to be measured without physical contact, eliminating mechanical stress and yield loss while enabling delay time measurement through secondary particle emission detection

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Measurement precision

If late-stage testing is used for delay measurement, then some measurements can be performed, but early detection of manufacturing defects is not possible

Engineering Contradiction:
Improvedelay measurement capabilityVSAvoiddetection timing
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent enables delay measurement at early manufacturing stages by using charged particle beam irradiation on conductive lines before final device assembly and packaging. This preliminary measurement capability allows detection of manufacturing defects early in the production process, preventing defective devices from proceeding to later stages

Inventive Principle:
Principle #10Preliminary action

3Ease of operation

If charged particle beam pulses are used for delay measurement, then contactless early-stage measurement is enabled, but complex measurement systems are required

Engineering Contradiction:
Improvecontactless measurement capabilityVSAvoidmeasurement system complexity
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The patent uses secondary charged particle emission as an intermediary signal to measure delay time. The charged particle beam irradiates the conductive line, and the secondary particles emitted from the line carry information about the line's electrical characteristics. This intermediary mechanism enables non-contact measurement while using existing charged particle beam technology platforms

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables early-stage detection of circuit delays without mechanical stress, providing accurate measurements of RC constants and line delays, improving manufacturing yield.

Implementation Method 1

measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam

Methodology Applied
Scientific EffectSecondary charged particle emission:

Data Source

PatentUS12494341B2Delay time measurement method and system
Publication Date: 2025.12.09 ASML NETHERLANDS BV
  • US12494341B2 patent drawing
  • US12494341B2 patent drawing
  • US12494341B2 patent drawing

AI summary

A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.