Circuit Pattern Inspection Noise Analysis

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Solution Overview

Problem

The electron beam type inspecting apparatus outputs false inspection results due to image noise interference, making it difficult to identify the causes of noise generation, which requires a long time and affects the operation rate of the circuit pattern inspecting apparatus.

Innovation Solution

A circuit pattern inspecting apparatus that includes an image processing unit for generating images from secondary or backscattering electrons and a control unit for performing frequency analysis of noise in the images, allowing for the detection of abnormalities and necessary maintenance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If frequency analysis of noise is performed to identify noise sources, then inspection accuracy is improved, but operation rate decreases due to additional processing time

Engineering Contradiction:
Improveinspection accuracyVSAvoidoperation rate
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The system performs frequency analysis of noise in advance to identify potential noise sources and their characteristics before they affect inspection results. By proactively analyzing noise patterns and predicting potential issues, the system can prepare appropriate countermeasures without interrupting the normal inspection flow, thus maintaining high operation rates while ensuring inspection accuracy.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If noise analysis and identification processes are implemented, then false inspection results are reduced, but maintenance time increases

Engineering Contradiction:
Improveinspection result accuracyVSAvoidmaintenance time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The system continuously monitors noise characteristics during operation and provides feedback about noise sources and their impact on inspection quality. This real-time feedback mechanism allows the system to automatically adjust parameters or alert operators only when necessary, reducing unnecessary maintenance interventions while maintaining high inspection reliability.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The frequency analysis system automatically identifies noise sources and generates diagnostic information without requiring manual intervention. The system self-diagnoses potential issues and can automatically implement corrective measures or schedule maintenance only when actual problems are detected, minimizing maintenance time while ensuring inspection accuracy.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables timely maintenance judgments, preventing decreases in the operation rate of the apparatus by measuring image noise and identifying noise sources, thereby improving inspection accuracy and efficiency.

Implementation Method 1

an electron beam is irradiated on the semiconductor wafer, a secondary signal of generated secondary electrons, back scattering electrons, and the like, is detected

Methodology Applied
Scientific EffectSecondary electron emission: Photoelectric Effect

Implementation Method 2

a secondary signal of generated secondary electrons, back scattering electrons, and the like, is detected

Methodology Applied
Scientific EffectBack scattering: Compton Scattering

Data Source

PatentUS8565509B2Circuit pattern inspecting apparatus, management system including circuit pattern inspecting apparatus, and method for inspecting circuit pattern
Publication Date: 2013.10.22 HITACHI HIGH TECH CORP
  • US8565509B2 patent drawing
  • US8565509B2 patent drawing
  • US8565509B2 patent drawing

AI summary

The operation rate of a circuit pattern inspecting apparatus is prevented from deteriorating by measuring image noise of the circuit pattern inspecting apparatus and detecting the sign that the apparatus is to be in an abnormal state. Provided is the circuit pattern inspecting apparatus wherein circuit pattern abnormalities are detected by irradiating a substrate having a circuit pattern formed thereon with an electron beam and detecting generated secondary electrons or reflected electrons. The circuit pattern inspecting apparatus is provided with: an image processing section wherein an image is generated based on the signal intensities of the detected secondary electrons or those of the reflected electrons and the image is displayed for a display apparatus of the interface; and a control section which analyzes the frequency of noise included in the image.