Circular Gas Passage Stabilizes Flow in Semiconductor Heating Base

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Solution Overview

Problem

Conventional gas providing passages in heating devices for semiconductor and liquid crystal substrate processing are prone to unstable gas flow and deformation, leading to inconsistent gas supply.

Innovation Solution

A processing device with a base featuring circular cross-section gas providing passages that stabilize gas flow by reducing heat conduction interference from the resistance heating body and preventing deformation through precise machining, ensuring uniform heating and stable gas delivery.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a conventional gas providing passage is formed by bonding ceramic plates with rectangular grooves, then the structure can be manufactured, but the gas flow becomes unstable and the passage deforms due to heat

Engineering Contradiction:

Improvemanufacturability of gas providing passageVSAvoidstability of gas flow

Core Design Contradiction:

Ease of manufactureVSReliability

Solution Approach 1:

The gas providing passage is changed from a rectangular cross-section to a circular cross-section. This curvature change eliminates the corners where heat accumulates and causes deformation, resulting in stable gas flow without the reliability issues of the conventional rectangular design

Inventive Principle:

Principle #14Spheroidality (Curvature)

Solution Approach 2:

The invention changes the geometric parameter of the passage cross-section from rectangular to circular. This parameter change fundamentally alters the heat distribution and flow characteristics, eliminating the deformation problem while maintaining manufacturability through standard ceramic processing techniques

Inventive Principle:

Principle #35Parameter changes

2Ease of manufacture

If ceramic plates are bonded to form the gas providing passage, then the passage can be constructed, but deformation occurs during heating causing unstable gas flow

Engineering Contradiction:

Improveconstruction of gas providing passageVSAvoiddimensional stability under heat

Core Design Contradiction:

Ease of manufactureVSStability of the object's composition

Solution Approach 1:

The circular cross-section design eliminates the rectangular corners that are prone to heat concentration and deformation. The curved geometry distributes thermal stress uniformly, maintaining dimensional stability under heating conditions while preserving the bonded ceramic plate construction method

Inventive Principle:

Principle #14Spheroidality (Curvature)

3Productivity

If the gas providing passage is heated during operation, then gas can be supplied, but the passage deforms leading to unstable flow and difficulty in stable gas provision

Engineering Contradiction:

Improvegas supply capabilityVSAvoidconsistency of gas flow

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The circular cross-section passage design inherently resists thermal deformation by distributing heat uniformly around the circumference. This maintains consistent gas flow characteristics during heating operations, ensuring reliable and stable gas provision to the processing chamber

Inventive Principle:

Principle #14Spheroidality (Curvature)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device achieves stable and uniform gas supply to the substrate, reducing gas flow loss and enhancing heating performance by maintaining a consistent flow rate and temperature distribution.

Implementation Method 1

reducing heat conduction interference from the resistance heating body

Methodology Applied

Scientific EffectHeat conduction: Conduction (thermal)

Implementation Method 2

a resistance heating body 12

Methodology Applied

Scientific EffectJoule heating: Joule Heating

Data Source

PatentUS8394199B2Processing device

Publication Date: 2013.03.12 NGK INSULATORS LTD

AI summary

A processing device is provided, including a base which holds a processing target. A gas providing passage having a circular cross section is formed in the base, and provides gas to an outer circumference of the base.