Citraconimide Underfill Composition for Low-Loss Chip Mounting
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Solution Overview
Problem
Current underfill materials for semiconductor chip mounting, such as epoxy resins, exhibit high relative permittivity and dielectric tangent, leading to increased transmission loss and material warpage, and lack suitable adhesiveness and infiltration properties for high-frequency applications.
Innovation Solution
An underfill composition comprising a citraconimide compound, epoxy resin, epoxy resin curing agent, curing accelerator, and inorganic filler, specifically designed to achieve low relative permittivity, low dielectric tangent, and enhanced adhesiveness, with the citraconimide compound being a key component that improves compatibility and dielectric properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If epoxy resin is used as underfill material, then good adhesiveness and structural strength are achieved, but high relative permittivity and dielectric tangent cause increased transmission loss and material warpage
Solution Approach 1:
The patent uses a composite resin system combining epoxy resin with citraconimide compound and polyphenylene ether. This composite approach allows the material to achieve low dielectric properties (relative permittivity 3.0 or less, dielectric tangent 0.01 or less) while maintaining good adhesiveness and structural strength, resolving the contradiction between adhesiveness and transmission loss.
2Object-affected harmful factors
If heat-curable resins or thermoplastic resins are used to achieve low relative permittivity and dielectric tangent, then dielectric properties are improved, but high melt viscosity and hard/brittle cured products make them unsuitable for semiconductor encapsulation
Solution Approach 1:
The patent modifies the resin composition by incorporating citraconimide compound with specific molecular weight (200-10,000) and controlling the ratio of resin components. This parameter optimization achieves low dielectric properties while maintaining low melt viscosity and good infiltration properties, making the material suitable for semiconductor encapsulation applications.
3Ease of manufacture
If conventional underfill materials are used, then manufacturing process is simple, but high relative permittivity causes material warpage and reduced manufacturing yield
Solution Approach 1:
The patent develops a composite underfill material combining epoxy resin, citraconimide compound, and polyphenylene ether that achieves low relative permittivity (3.0 or less) and low dielectric tangent (0.01 or less). This composite formulation reduces material warpage and improves substrate manufacturing yield while maintaining ease of manufacture through conventional processing methods.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition demonstrates superior infiltration properties and excellent dielectric properties with low relative permittivity and dielectric tangent, along with improved adhesiveness, making it suitable for high-frequency applications and reducing material warpage.
Implementation Method 1
there is a demand for underfill materials possessing low-dielectric properties such as low relative permittivity and low dielectric tangent, which enable minimization of transmission loss during signal propagation
Implementation Method 2
an underfill material with a low Coefficient of Linear Thermal Expansion (CTE) is highly regarded for mitigating material warpage and improving substrate manufacturing yield
Implementation Method 3
an epoxy resin curing agent reactive with the epoxy groups
Data Source
AI summary
Provided is an underfill composition having a low relative permittivity and a low dielectric tangent. The underfill composition contains the components of: (A) a citraconimide compound; (B) an epoxy resin; (C) an epoxy resin curing agent; (D) a curing accelerator, and (E) an inorganic filler, wherein the citraconimide compound (A) is a biscitraconimide compound represented by the following formula (1):wherein A in the formula (1) represents a divalent organic group.


