Clamp Apparatus With Local Exhaust For Substrate Transfer
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Solution Overview
Problem
There is a challenge in semiconductor manufacturing to reduce particle scattering during the transfer of substrates, particularly when the cover of a substrate accommodating container is opened or closed, which can contaminate the substrate transfer section and compromise cleanliness in clean room environments.
Innovation Solution
A clamp apparatus is designed with a clamp member that fixes the substrate accommodating container from the upper side, a driving mechanism, a casing with an exhaust chamber and suction port, and a fan to minimize particle scattering by using local exhaust ducts and a cleaning filter to maintain cleanliness during substrate transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a clamp member is driven to fix the substrate accommodating container during cover opening/closing, then the container is securely positioned, but particles are scattered into the substrate transfer section
Solution Approach 1:
The harmful factor (particles) is extracted and removed from the system by introducing a suction port and fan to actively exhaust particles generated during clamp member operation, separating the clamping function from particle contamination
Solution Approach 2:
A gas flow is introduced as an intermediary between the clamp member and substrate transfer section. The suction port and fan create a controlled gas flow that acts as a barrier, preventing particles generated during clamping from reaching the substrate transfer section
2Ease of operation
If the cover of the substrate accommodating container is opened/closed for substrate transfer, then substrate access is enabled, but particles are generated and scattered
Solution Approach 1:
Particles generated during cover opening/closing are extracted and removed using the suction port and fan system, actively extracting the harmful factor from the vicinity of the substrate transfer section
Solution Approach 2:
The suction port and fan operate continuously during cover opening/closing operations to maintain a consistent particle removal action, ensuring that particle suppression is continuous rather than intermittent
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The clamp apparatus effectively reduces particle scattering and maintains cleanliness in the substrate transfer section by using local exhaust ducts and a cleaning filter to suppress particles generated during the opening and closing of the cover, ensuring a clean environment for substrate processing.
Implementation Method 1
an exhaust chamber provided near the casing and including a suction port configured to communicate with the casing; and a fan provided within the exhaust chamber
Data Source
AI summary
The clamp apparatus of the present disclosure includes a clamp member configured to contact a substrate accommodating container from an upper side and fix the substrate accommodating container to a predetermined position when a cover provided on a front surface of the substrate accommodating container is opened/closed, a driving mechanism configured to drive the clamp member; a casing configured to cover the driving mechanism, a suction port configured to communicate with the casing, an exhaust chamber provided near the casing, and a fan provided inside the exhaust chamber.