Cleaning Non-Bonding Surfaces to Suppress Void Formation

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Solution Overview

Problem

Conventional bonding systems face issues with void formation due to deposits adhering to non-bonding surfaces of substrates, leading to misalignment and poor bonding quality during the bonding process of semiconductor wafers.

Innovation Solution

Incorporation of a cleaning apparatus that cleans the non-bonding surfaces of substrates before bonding, utilizing a polishing member and sponge to remove deposits and maintain surface flatness, combined with a surface modifying and hydrophilizing apparatus to prepare bonding surfaces for Van der Waals and hydrogen bonding.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a bonding system performs plasma processing and hydrophilization on bonding surfaces, then bonding quality is improved, but deposits still adhere to non-bonding surfaces causing void formation

Engineering Contradiction:
Improvebonding qualityVSAvoidvoid formation due to deposits
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The cleaning apparatus performs preliminary cleaning of the non-bonding surfaces before the bonding process. The polishing member and sponge remove deposits from non-bonding surfaces in advance, preventing void formation during subsequent bonding operations.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The bonding system is divided into separate functional modules: a surface modifying apparatus for bonding surfaces, a cleaning apparatus for non-bonding surfaces, and a bonding apparatus. This segmentation allows each module to optimize its specific function without interfering with others.

Inventive Principle:
Principle #1Segmentation

2Manufacturing precision

If polishing members and sponges are used to clean non-bonding surfaces, then surface flatness is maintained, but device complexity increases

Engineering Contradiction:
Improvesurface flatnessVSAvoidcleaning apparatus structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

A sponge is introduced as an intermediary element between the polishing member and the non-bonding surface. The sponge applies gentle pressure and absorbs cleaning solutions, enabling effective cleaning while maintaining surface flatness without requiring complex mechanical pressure control systems.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Reliability

If cleaning is performed on non-bonding surfaces before bonding, then void formation is suppressed, but processing time increases

Engineering Contradiction:
Improvebonding reliabilityVSAvoidprocessing time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The cleaning apparatus is integrated into the bonding system's processing flow, allowing continuous operation. The cleaning of non-bonding surfaces is performed as part of the overall bonding preparation process without requiring separate batch processing, maintaining continuous production flow.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively suppresses void formation and enhances bonding quality by ensuring clean, flat non-bonding surfaces, improving the precision and reliability of substrate bonding.

Implementation Method 1

after the surfaces of the substrates are modified in the surface modifying apparatus by performing a plasma processing on the surfaces of the substrates

Methodology Applied
Scientific EffectPlasma processing: Plasma

Implementation Method 2

the surfaces of the substrates are hydrophilized in the surface hydrophilizing apparatus by supplying pure water onto the surfaces of the substrates

Methodology Applied
Scientific EffectHydrophilization: Hydrophile

Implementation Method 3

the two sheets of substrates placed to face each other are bonded by a Van der Waals force and a hydrogen bond

Methodology Applied
Scientific EffectVan der Waals force: Van der Waals Force

Implementation Method 4

the two sheets of substrates placed to face each other are bonded by a Van der Waals force and a hydrogen bond

Methodology Applied
Scientific EffectHydrogen bond: Chemical Bonding

Data Source

PatentUS11626302B2Bonding method for cleaning non-bonding surface of substrate
Publication Date: 2023.04.11 TOKYO ELECTRON LTD
  • US11626302B2 patent drawing
  • US11626302B2 patent drawing
  • US11626302B2 patent drawing

AI summary

A bonding system includes a surface modifying apparatus configured to modify a bonding surface of a first substrate and a bonding surface of a second substrate; a surface hydrophilizing apparatus configured to hydrophilize the modified bonding surface of the first substrate and the modified bonding surface of the second substrate; a bonding apparatus configured to perform bonding of the hydrophilized bonding surface of the first substrate and the hydrophilized bonding surface of the second substrate in a state that the bonding surfaces face each other; and a cleaning apparatus configured to clean, before the bonding is performed, a non-bonding surface of, between the first substrate and the second substrate, at least one which is maintained flat when the bonding is performed, the not-bonding surface being opposite to the bonding surface.