High-Pressure Pump Bypass Valve Control for Cleaning Pressure Stability

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Solution Overview

Problem

High-pressure cleaning apparatuses lack reliable control over liquid pressure, leading to inconsistent performance and inefficient use of cleaning chemicals.

Innovation Solution

Incorporating a return line with a valve unit and a pressure sensor to control liquid pressure by changing the free cross-sectional area of the return line, allowing for predetermination of pressure levels and adjustment of cleaning chemical dosages based on operational modes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a high-pressure pump is used to pressurize liquid, then liquid pressure is increased, but reliable control over liquid pressure is lacking

Engineering Contradiction:
Improveliquid pressure control reliabilityVSAvoidpressure control ease
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

A pressure sensor detects the actual liquid pressure in the pressure chamber and feeds this information back to a control unit. The control unit compares the detected pressure with a desired pressure value and adjusts the valve unit accordingly to maintain the desired pressure, enabling reliable closed-loop pressure control

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The valve unit changes the free cross-sectional area of the return line to regulate the flow of liquid back to the suction chamber. By adjusting this geometric parameter, the system controls the liquid pressure in the pressure chamber, transitioning from fixed to variable pressure control

Inventive Principle:
Principle #35Parameter changes

2Productivity

If cleaning chemicals are added to the liquid, then cleaning performance is improved, but inefficient use of cleaning chemicals occurs

Engineering Contradiction:
Improvecleaning performanceVSAvoidcleaning chemical efficiency
Core Design Contradiction:
ProductivityVSLoss of substance

Solution Approach 1:

The system adjusts the free cross-sectional area of the return line to control liquid pressure and flow rate. This enables optimization of the cleaning chemical dosage by matching the chemical injection rate to the actual cleaning requirements and liquid flow, reducing waste while maintaining effectiveness

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The pressure sensor provides real-time feedback on liquid pressure, allowing the control system to adjust cleaning chemical dosing based on actual operating conditions. This ensures cleaning chemicals are used efficiently only when and where needed, rather than continuous wasteful application

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables reliable control of liquid pressure and efficient use of cleaning chemicals, improving the operational reliability and user-friendliness of high-pressure cleaning apparatuses.

Implementation Method 1

a pressure sensor which is coupled to the control unit and by which a liquid pressure is detectable on the pressure side of the pump chamber

Methodology Applied
Scientific EffectPressure detection:

Implementation Method 2

a valve unit by which a free cross-sectional area of the return line is changeable... by changing the free cross-sectional area of the return line

Methodology Applied
Scientific EffectFlow resistance control:

Data Source

PatentUS10960440B2High-pressure cleaning apparatus
Publication Date: 2021.03.30 ALFRED KARCHER SE & CO KG
  • US10960440B2 patent drawing
  • US10960440B2 patent drawing
  • US10960440B2 patent drawing

AI summary

A high-pressure cleaning apparatus including a high-pressure pump that includes a suction chamber, at least one pump chamber in which liquid is pressurized, and a pressure chamber arranged downstream of the pump chamber is disclosed. The high-pressure pump includes a return line via which the pressure chamber is in flow communication with the suction chamber, and a valve unit by which a free cross-sectional area of the return line is changeable. The high-pressure cleaning apparatus also includes a drive unit associated with the valve unit, a control unit coupled to the drive unit and a pressure sensor coupled to the control unit for detecting liquid pressure on the pressure side of the pump chamber. Depending on the signal of the pressure sensor, the liquid pressure can be controllable to a predetermined or predeterminable liquid pressure by changing of the free cross-sectional area of the return line.