Cleaning Apparatus for Organic EL Masks

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Solution Overview

Problem

The accuracy of vapor-depositing organic materials for organic electroluminescent (EL) elements is compromised due to the accumulation of organic materials on deposition masks, leading to narrowed holes and increased costs from frequent mask replacement.

Innovation Solution

A cleaning apparatus comprising a system with cleaning and rinse tanks, using hydrocarbon and fluorine compound solutions, and a carrying device to hold and move the mask at a predetermined angle, ensuring effective removal and reuse of organic materials from the mask without heat-induced damage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the mask is reused multiple times for vapor-deposition processes, then productivity is improved by reducing mask replacement frequency, but manufacturing precision deteriorates due to organic material accumulation narrowing the holes

Engineering Contradiction:
Improvemask reuse frequencyVSAvoidvapor-deposition accuracy
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies parameter changes by transitioning the mask from a horizontal to a vertical orientation during cleaning. This positional parameter change allows the cleaning solution to effectively reach and remove organic material accumulation from the mask surface and holes, thereby restoring manufacturing precision while maintaining productivity through mask reuse

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent introduces a cleaning solution as an intermediary substance between the mask and the organic material accumulation. This intermediary chemical agent facilitates the removal of contaminants that would otherwise directly affect vapor-deposition accuracy, enabling the mask to maintain precision over multiple uses

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If the mask is cleaned thoroughly to remove organic material, then manufacturing precision is improved, but device complexity increases due to additional cleaning equipment and processes

Engineering Contradiction:
Improvemask hole accuracyVSAvoidcleaning system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies inversion by changing the mask orientation from horizontal to vertical during cleaning. This simple geometric inversion fundamentally improves cleaning effectiveness without requiring complex cleaning mechanisms, thereby achieving manufacturing precision restoration while minimizing increases in device complexity

Inventive Principle:
Principle #13The other way round (Inversion)

Solution Approach 2:

The vertical positioning of the mask during cleaning allows gravity to assist the cleaning solution in reaching all surfaces of the mask, including the holes. This self-service approach utilizing gravitational force reduces the need for complex active cleaning mechanisms, balancing manufacturing precision improvement against device complexity

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus maintains mask accuracy and reduces costs by thoroughly cleaning and rinsing the mask, preventing organic material buildup and allowing for repeated use, thus enhancing the vapor-deposition process efficiency.

Implementation Method 1

a cleaning tank (21) for cleaning the mask (10) with a cleaning solution

Methodology Applied
Scientific EffectDissolution: Solvation

Implementation Method 2

a rinse tank (51) for rinsing the mask (10) cleaned in the cleaning tank (21) with a rinse solution

Methodology Applied
Scientific EffectRinsing: Fluid Spray

Data Source

PatentUS7581551B2Cleaning apparatus
Publication Date: 2009.09.01 SANYO ELECTRIC CO LTD
  • US7581551B2 patent drawing
  • US7581551B2 patent drawing
  • US7581551B2 patent drawing

AI summary

The invention provides a cleaning apparatus which can remove an organic material for an organic EL element attaching to a mask made of a thin metal film. The cleaning apparatus of the invention includes first and second cleaning tanks cleaning a mask with a predetermined cleaning solution at room temperature, first and second rinse tanks rinsing the mask with a predetermined rinse solution at room temperature, and a carrying device holding the mask at a predetermined angle other than horizontally and carrying the mask held at the predetermined angle to the first and second cleaning tanks and the first and second rinse tanks without damage occurring to the thin metal film of the mask by stress caused by gravity. The carrying device holds the mask horizontally at first, stands up in a vertical direction while holding the mask to hold the mask at the predetermined angle.