Cleaning Composition for Fast Polysiloxane Adhesive Removal
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Solution Overview
Problem
Existing cleaning agent compositions are ineffective in efficiently removing polysiloxane adhesive residues from semiconductor substrates without damaging the substrate, particularly during high-temperature processing steps, and there is a need for a more effective cleaning method.
Innovation Solution
A cleaning agent composition comprising a quaternary ammonium salt, an amphoteric surfactant as an etching rate enhancer, and an organic solvent is used to remove adhesive residues, with the amphoteric surfactant enhancing the cleaning efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional cleaning agent compositions are used to remove polysiloxane adhesive residues, then cleaning can be performed, but the cleaning efficiency is insufficient and the process time is extended
Solution Approach 1:
The patent changes the chemical parameters of the cleaning agent by incorporating specific additives (quaternary ammonium salt and amphoteric surfactant) that enhance the etching rate and cleaning efficiency. This allows the cleaning process to be completed in 30 seconds to 5 minutes, significantly reducing the cleaning time while improving effectiveness.
2Productivity
If stronger cleaning agents are used to improve cleaning efficiency, then adhesive residues can be removed faster, but the substrate may be damaged or corroded
Solution Approach 1:
The patent uses an amphoteric surfactant as an intermediary substance that facilitates the removal of adhesive residues without directly attacking the substrate. The surfactant acts as a mediator between the cleaning agent and the adhesive residue, enabling efficient cleaning while protecting the substrate from damage through its gentle yet effective cleaning mechanism.
3Reliability
If existing cleaning compositions are used, then the substrate can be cleaned, but the cleaning performance is insufficient particularly during high-temperature processing steps
Solution Approach 1:
The patent creates a composite cleaning composition by combining multiple components: quaternary ammonium salt, amphoteric surfactant, and organic solvent. This composite formulation provides both reliable cleaning performance and adaptability to high-temperature processing conditions, as each component contributes specific properties that work synergistically to maintain effectiveness across varying temperature conditions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively removes polysiloxane adhesive residues from semiconductor substrates in a short time, ensuring high cleaning efficiency without substrate damage, even at elevated temperatures.
Implementation Method 1
a cleaning agent composition comprising a quaternary ammonium salt, an amphoteric surfactant as an etching rate enhancer
Implementation Method 2
an amphoteric surfactant as an etching rate enhancer
Data Source
AI summary
A method for producing a cleaning agent composition for use in removal of, for example, a polysiloxane adhesive. The composition contains a quaternary ammonium salt, an etching rate enhancer formed of an amphoteric surfactant, and an organic solvent.