Self-Contained Cleaning Device for Lithographic Substrates
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Solution Overview
Problem
Lithographic apparatuses face significant downtime and contamination risks during maintenance due to the time-consuming process of manually cleaning critical components, which can lead to increased productivity losses and costs.
Innovation Solution
A cleaning device with a body compatible with production substrates, featuring a chamber for contaminant collection and a fluid flow system that uses vacuum pressure to draw contaminants into the chamber, preventing their re-entry and allowing for efficient cleaning of components like liquid confinement structures without opening the apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If manual cleaning of critical components is performed by opening the apparatus, then cleaning effectiveness is improved, but downtime increases and contamination risk increases
Solution Approach 1:
The cleaning device enables self-contained cleaning operations within the apparatus. The device includes a cleaning head with cleaning elements that can be positioned against components, a fluid delivery system that provides cleaning fluid, and a collection system that removes contaminants. The apparatus cleans itself without requiring external manual intervention or opening of the system.
Solution Approach 2:
A cleaning device acts as an intermediary tool between the operator and the critical components. The device includes a cleaning head with cleaning elements (such as brushes, wipes, or sprays) that contact the components, while the operator controls the device from outside the sealed apparatus. This intermediary mechanism allows cleaning without direct manual contact with the components and without opening the apparatus.
2Ease of operation
If manual cleaning is performed by opening the apparatus, then access to components is improved, but contamination risk increases
Solution Approach 1:
The cleaning device extracts the cleaning function from the main apparatus operation. It includes a separate cleaning head, fluid delivery system, and collection system that can be activated independently. The cleaning contaminants are removed through dedicated channels (suction or drainage) separate from the process fluid paths, preventing cross-contamination.
Solution Approach 2:
The cleaning device enables self-contained cleaning operations within the apparatus. The device includes a cleaning head with cleaning elements that can be positioned against components, a fluid delivery system that provides cleaning fluid, and a collection system that removes contaminants. The apparatus cleans itself without requiring external manual intervention or opening of the system.
3Productivity
If cleaning is performed without opening the apparatus, then downtime is reduced, but cleaning accessibility may be limited
Solution Approach 1:
The cleaning device incorporates dynamic positioning capabilities. The cleaning head can be moved along rails or guides to access different areas of the components. The device may include adjustable arms or extendable mechanisms that adapt to the geometry of the components being cleaned, enabling thorough cleaning of hard-to-reach areas while maintaining the sealed apparatus configuration.
Solution Approach 2:
The cleaning device is designed with universal applicability. It includes a cleaning head with interchangeable cleaning elements (brushes, wipes, sprays) that can accommodate different component types and geometries. The fluid delivery system can adjust flow rate and pressure, and the collection system can handle various contaminant types, making the device versatile for cleaning multiple critical components within the apparatus.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution minimizes downtime by enabling quick and controlled cleaning of critical components within the lithographic apparatus, reducing the risk of contamination and maintaining a clean environment, thus enhancing productivity and reducing operational costs.
Implementation Method 1
a vacuum source 205 configured to create negative pressure between the cleaning device 200 and the substrate holder 110
Implementation Method 2
The outlet 207 is provided with a filter 208 configured to prevent a contaminant 51 from exiting the chamber 201
Data Source
AI summary
A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.