Substrate Cleaning Roller Splash Prevention
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Solution Overview
Problem
Conventional substrate cleaning apparatuses often splash liquid chemicals onto the upper surface of substrates during the cleaning process, which can damage display elements in flat panel displays.
Innovation Solution
A substrate cleaning apparatus that uses a cleaning roller with brushes to apply liquid chemicals and pure water to the lower surface of the substrate, combined with an air supply unit and a splash preventing member to prevent fluid from being splashed onto the upper surface, and a substrate movement sensor to control the speed of the brushes for precise cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If liquid chemical is supplied to clean the lower surface of the substrate, then cleaning effectiveness is improved, but liquid chemical splashes onto the upper surface causing damage to display elements
Solution Approach 1:
The cleaning roller acts as an intermediary device between the liquid chemical supply and the substrate. It absorbs and distributes the liquid chemical through its porous structure and brush surface, preventing direct splash contact with the substrate upper surface while ensuring effective cleaning of the lower surface
Solution Approach 2:
The cleaning roller utilizes a flexible brush surface that conforms to the substrate curvature, creating a controlled interface for liquid chemical application. This flexible contact surface prevents uncontrolled splashing while maintaining effective cleaning coverage
2Productivity
If high speed rotation of cleaning roller is used for efficient cleaning, then cleaning productivity is improved, but liquid chemical splashes more readily onto the substrate upper surface
Solution Approach 1:
The system changes the operational parameters by controlling the rotation speed of the cleaning roller and the supply rate of liquid chemical to match. This coordinated parameter adjustment ensures that at higher rotation speeds, the liquid chemical is distributed more evenly without excessive splashing, maintaining both productivity and safety
3Manufacturing precision
If more liquid chemical is supplied to ensure thorough cleaning, then cleaning quality is improved, but the cleaning roller becomes unstable and splashes increase
Solution Approach 1:
The system adjusts multiple parameters including liquid chemical viscosity, supply pressure, and roller rotation speed to work in harmony. This multi-parameter optimization allows thorough cleaning with adequate liquid chemical while preventing roller instability and splashing through balanced operational conditions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively prevents liquid chemicals from splashing onto the upper surface of the substrate, ensuring the lower surface is cleaned without damaging the display elements, while maintaining efficient cleaning processes.
Implementation Method 1
an air supply unit installed on an upper portion of a second surface of the substrate in order to prevent the liquid chemical from being splashed to the second surface of the substrate
Implementation Method 2
a first cleaning roller rotatably installed within the housing and having an upper portion configured to contact with the substrate
Data Source
AI summary
A substrate cleaning apparatus is provided. The substrate cleaning apparatus includes a plurality of transfer rollers for transferring a substrate; a liquid chemical feeder supplying a liquid chemical to a first surface of the substrate; wherein the liquid chemical feeder comprises a first housing and a first cleaning roller rotatably installed within the housing and having an upper portion configured to contact with the substrate.