Cleaning Vessel Surface Wetting to Prevent Chemical Corrosion

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The use of high-temperature chemical liquids with strong etching action for cleaning substrates can corrode the cleaning vessel in polishing apparatuses, leading to increased costs due to the need for expensive corrosion-resistant materials.

Innovation Solution

A substrate cleaning apparatus with a cleaning vessel made of inexpensive materials, equipped with a hydrophilization treatment for the inner surface and oscillating cleaning liquid nozzles that supply a cleaning liquid to form a protective film on the inner surface, preventing chemical liquid from contacting the vessel.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a material with high corrosion resistance is used to constitute the cleaning vessel, then the cleaning vessel can be protected from corrosion by chemical liquid, but the cost of the cleaning apparatus increases

Engineering Contradiction:
Improvecorrosion resistanceVSAvoidcost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

A cleaning liquid film is introduced as an intermediary protective layer between the chemical liquid and the cleaning vessel inner surface. This film acts as a mediator that prevents direct contact between the corrosive chemical liquid and the vessel, allowing the use of cost-effective materials while maintaining corrosion resistance

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention uses a disposable or easily replenishable cleaning liquid film instead of expensive corrosion-resistant materials for the vessel. The cleaning liquid serves as a temporary protective barrier that can be continuously supplied and replaced, substituting for costly permanent protective materials

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

2Reliability

If cleaning liquid nozzles are made to oscillate to supply cleaning liquid onto the entire inner surface, then the protective coverage is improved, but the device complexity increases

Engineering Contradiction:
Improveprotective coverageVSAvoidnozzle mechanism complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The cleaning liquid nozzles are made oscillatable to dynamically adjust the spraying direction and coverage area. This dynamic capability allows a single nozzle to cover the entire inner surface by changing its orientation, replacing the need for multiple fixed nozzles positioned at every location

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The oscillating nozzle mechanism provides multi-functionality by enabling a single nozzle to perform the work of multiple fixed nozzles. By oscillating, one nozzle can target different regions of the inner surface sequentially, making the system more versatile and less complex than a multi-nozzle configuration

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus effectively protects the cleaning vessel from corrosion while using cost-effective materials by ensuring a uniform film of cleaning liquid covers the inner surface, preventing chemical liquid contact and maintaining apparatus integrity.

Implementation Method 1

The inner surface of the cleaning vessel has been subjected to a hydrophilization treatment

Methodology Applied
Scientific EffectHydrophilization treatment: Hydrophile

Implementation Method 2

an oscillation mechanism for causing the plurality of cleaning liquid nozzles to oscillate

Methodology Applied
Scientific EffectOscillation: Vibration

Data Source

PatentUS10096492B2Substrate cleaning apparatus and polishing apparatus
Publication Date: 2018.10.09 EBARA CORP
  • US10096492B2 patent drawing
  • US10096492B2 patent drawing
  • US10096492B2 patent drawing

AI summary

A substrate cleaning apparatus capable of preventing a cleaning vessel from being corroded by a chemical liquid while constituting the cleaning vessel with a low-price material is provided. The substrate cleaning apparatus includes: a cleaning vessel for holding a substrate therein; a substrate holder arranged in the cleaning vessel; a chemical liquid nozzle for supplying a chemical liquid onto the substrate held by the substrate holder; and a plurality of cleaning liquid nozzles for supplying a cleaning liquid onto an inner surface of the cleaning vessel. The inner surface of the cleaning vessel has been subjected to a hydrophilization treatment.