Cleansing Material for Thin Film Transistor Panels
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Solution Overview
Problem
The existing cleansing materials for manufacturing thin film transistor array panels, particularly those containing tetra-methyl ammonium hydroxide (TMAH), corrode aluminum conductors and fail to effectively clean signal lines, leading to increased resistance and signal delay in larger LCDs.
Innovation Solution
A cleansing material comprising ultrapure water, cyclic amine, pyrogallol, benzotriazole, and methyl glycol is used to clean the substrates during the manufacturing process of thin film transistor array panels, which effectively removes contaminants without damaging aluminum conductors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If TMAH-based cleansing material is used, then cleaning effectiveness is improved, but aluminum conductor corrosion increases
Solution Approach 1:
The invention changes the chemical composition parameters of the cleansing material by replacing TMAH with a composite system containing cyclic amine, pyrogallol, and benzotriazole. This parameter change maintains cleaning effectiveness while eliminating aluminum corrosion, as the new composition provides both cleaning power and corrosion protection through the synergistic action of its components.
Solution Approach 2:
The invention uses a composite cleansing material comprising multiple components (cyclic amine, pyrogallol, benzotriazole, and methyl glycol) that work together to achieve both effective cleaning and corrosion protection. The composite nature of the material allows it to perform multiple functions simultaneously, resolving the contradiction between cleaning effectiveness and aluminum preservation.
2Object-affected harmful factors
If ultrapure water alone is used, then aluminum corrosion is prevented, but cleaning effectiveness is insufficient
Solution Approach 1:
The invention transitions from using ultrapure water alone to a composite cleansing material that includes cyclic amine, pyrogallol, benzotriazole, and methyl glycol. This composite formulation provides both the gentle nature needed to protect aluminum and the chemical activity required for effective cleaning, thereby resolving the contradiction between these two requirements.
Solution Approach 2:
The invention changes the composition parameters from pure water to a multi-component solution with specific concentrations of each ingredient. This parameter modification enables the cleansing material to achieve both aluminum protection and effective cleaning performance that neither component could achieve alone.
3Area of stationary object
If gate and data line lengths increase, then LCD size is improved, but resistance and signal delay increase
Solution Approach 1:
The invention converts the harmful effect of aluminum corrosion into a beneficial outcome by using a cleansing material that prevents corrosion. By eliminating corrosion damage to the aluminum conductors, the invention ensures maintained electrical conductivity and signal transmission quality, thereby supporting reliable performance in larger LCDs with longer gate and data lines.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed cleansing material provides effective cleaning of substrates, reducing signal delay and preventing aluminum corrosion, thereby improving the performance and reliability of thin film transistor array panels.
Implementation Method 1
A cleansing material comprising ultrapure water, cyclic amine, pyrogallol, benzotriazole, and methyl glycol is used to clean the substrates during the manufacturing process of thin film transistor array panels, which effectively removes contaminants without damaging aluminum conductors
Data Source
AI summary
A manufacturing a thin film transistor array panel includes depositing a first thin film including aluminum on a substrate, patterning the first thin film by photolithography and etching, cleansing the substrate including the first thin film, and depositing a second thin film on the cleansed substrate. The cleansing is performed using a cleansing material including ultrapure water, cyclic amine, pyrogallol, benzotriazole, and methyl glycol. The cleansing material includes ultrapure water at about 85 wt % to about 99 wt %, cyclic amine at about 0.01 wt % to about 1.0 wt %, pyrogallol at about 0.01 wt % to 1.0 wt %, benzotriazole at about 0.01 wt % to 1.0 wt %, and methyl glycol at about 0.01 wt % to 1.0 wt %.