Cleavable Gel Nail Polish Polymer for Fast, Gentle Removal

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Solution Overview

Problem

Existing gel nail polish removal methods, such as soak-off and mechanical sanding, are inefficient and can damage nails, necessitating a need for an easier and less harmful removal process.

Innovation Solution

A polymer composition comprising specific monomers that can be cured with UV light and easily removed by immersion in a cysteine and aqueous base solution, allowing for quick and gentle nail polish removal.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of time

If traditional soak-off method is used to remove gel polish, then removal can be achieved, but removal time exceeds 10 minutes and nails are exposed to damaging amounts of acetone

Engineering Contradiction:

Improveremoval timeVSAvoidacetone exposure damage

Core Design Contradiction:

Loss of timeVSObject-affected harmful factors

Solution Approach 1:

The patent modifies the chemical composition parameters of the gel polish by incorporating hydrolyzable functional groups (ester, amide, carbamate) that change the polymer's susceptibility to hydrolysis. This allows the polish to be designed for controlled degradation under specific conditions (removal solution with pH 6-8), replacing the need for harsh acetone soaking and reducing both time and chemical damage.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent introduces a removal solution containing enzymes (protease, lipase, or amylase) as intermediaries that catalyze the breakdown of the gel polish polymer. These enzymes act as mediators between the user and the polish, enabling gentle and rapid removal without direct exposure to damaging chemicals like acetone.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Loss of time

If mechanical sanding method is used to remove gel polish, then removal can be achieved quickly, but nail plate damage occurs

Engineering Contradiction:

Improveremoval timeVSAvoidnail plate damage

Core Design Contradiction:

Loss of timeVSObject-affected harmful factors

Solution Approach 1:

The patent replaces the mechanical sanding system with a chemical-biological degradation system. Instead of using physical abrasion to remove the polish, the invention uses hydrolysis and enzymatic degradation to break down the polymer chains, substituting mechanical force with chemical reactions that occur under mild conditions, thus preventing nail plate damage while maintaining efficient removal.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Strength

If gel polish is made more resistant to chipping and scratching, then durability is improved, but removal becomes more difficult and damaging

Engineering Contradiction:

Improvepolish durabilityVSAvoidremoval ease

Core Design Contradiction:

StrengthVSEase of operation

Solution Approach 1:

The patent creates a dynamic polymer network that exhibits different properties under different conditions. During application and wear, the crosslinked structure provides strength and durability. During removal, the presence of water and enzymes triggers hydrolysis of the dynamic covalent bonds, allowing the network to degrade and be easily removed. This dynamic behavior resolves the contradiction between durability and ease of removal.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The patent designs the polymer network with segmentable bonds (hydrolyzable ester, amide, or carbamate linkages) that can be selectively broken down. The polymer is segmented into smaller degradation products through hydrolysis, allowing the intact polish to provide durability during wear while enabling easy removal when exposed to water and enzymes, thus resolving the contradiction between strength and removal ease.

Inventive Principle:

Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables efficient and damage-free removal of gel nail polish within minutes, reducing exposure to harsh chemicals and minimizing nail damage.

Implementation Method 1

Gel polish is typically made up of monomers and a photo initiator that, when exposed to ultraviolet (UV) irradiation, initiates polymerization (i.e. cures the composition) into a resistant network coating on the nail

Methodology Applied

Scientific EffectPhotopolymerization: Photopolymerisation

Implementation Method 2

the polymer composition comprising a first monomer, a second monomer, and a third monomer... a method of removing a cosmetic, polymer composition from a nail bed comprises immersing a nail bed coated with a polymer composition in a removal solution comprising cysteine

Methodology Applied

Scientific EffectChemical bond cleavage: Chemical Bonding

Data Source

PatentUS20250352452A1Cleavable comonomer strategy for accelerating removal of gel nail polish

Publication Date: 2025.11.20 MASSACHUSETTS INST OF TECH

AI summary

The present invention provides polymer compositions for use in cosmetic nail polish compositions. More particularly, the present disclosure relates to the introduction of cleavable conomoner additives into an existing polymer composition to produce a chemically deconstructable composition. Methods and compositions for removing the nail polish composition are also disclosed.