Cluster Mass Flow Device for Gas Mixing Accuracy
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Solution Overview
Problem
In etch or thin film processes, the existing mass flow devices face compatibility issues and accuracy problems when delivering multiple gases to a processing chamber due to the spacing and complexity of gas lines, which affects the mixing of gases.
Innovation Solution
A cluster mass flow device comprising a controller, gas manifold, control valves, and flow sensors, which are electrically and fluidly coupled to regulate the flow of gases through a gas mixing region to maintain a desired mass flow, utilizing a gas flow recipe program to adjust valve positions based on measured flow signals.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If gas lines are spaced far apart to accommodate multiple components (valves, regulators, pressure transducers, mass flow controllers), then each gas line can be independently controlled, but compatibility issues arise when switching between different gases and mixing accuracy deteriorates
Solution Approach 1:
The patent integrates multiple gas line components (valves, regulators, flow controllers) into a single unified gas panel structure, merging previously separate components into one compact assembly. This allows close spacing of gas lines while maintaining independent control capability, thereby improving mixing accuracy without sacrificing operational independence.
Solution Approach 2:
The gas panel is designed as a universal platform that can handle multiple different gases through a standardized configuration. The integrated design provides multi-functional capability to accommodate various gas types and processes, enabling both independent control and accurate mixing within a single unified structure.
2Ease of operation
If gas lines are spaced far apart to accommodate multiple components, then each gas line can be independently controlled, but compatibility issues arise when switching between different gases
Solution Approach 1:
By consolidating multiple gas line components into one integrated gas panel, the system achieves close spacing of gas lines while maintaining independent control. This unified structure improves compatibility when switching between different gases by eliminating the spacing issues that caused contamination and mixing problems in previous distributed configurations.
Solution Approach 2:
The gas panel is divided into multiple separate gas line channels that are closely spaced but independently controllable. Each gas line maintains its own control components within the unified panel structure, allowing independent operation while improving gas switching compatibility through the compact integrated design.
3Ease of manufacture
If gas lines are spaced far apart, then components can be properly installed, but the distance affects the accuracy in quickly mixing together gases from different lines
Solution Approach 1:
The patent merges multiple gas line components into a compact integrated panel, dramatically reducing the distance between gas lines. This allows gases from different lines to reach the mixing point simultaneously and mix accurately, improving gas delivery speed and precision while maintaining proper component installation through the unified modular design.
Solution Approach 2:
The gas panel utilizes a three-dimensional integrated structure that accommodates multiple components in vertical and lateral arrangements, reducing the horizontal spacing between gas lines. This dimensional reorganization allows close spacing for fast mixing while providing adequate space for component installation and maintenance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures precise and accurate delivery of multiple gases to the processing chamber, improving compatibility and mixing efficiency by minimizing spacing between gas lines and using a control system to regulate gas flow.
Implementation Method 1
each flow sensor is positioned between the control valve and the gas mixing region, and downstream of the control valve. The controller is programmed to utilize a gas flow recipe program to automatically receive and process measured gas flow signals indicative of a flow rate of a gas flowing through each gas flow channel from each flow sensor
Implementation Method 2
Each gas distribution flow path of the gas manifold comprises a gas inlet configured to receive a gas, and a gas flow channel coupled to the gas inlet. The controller is programmed to provide a control signal to each control valve for controlling a position of each control valve such that a desired gas flow is produced
Implementation Method 3
The gas mixing region of the gas manifold is fluidly coupled to each gas flow channel. The controller is further programmed to adjust a position of each control valve to regulate gas flow based on the measured gas flow signals in order to maintain a desired mass of gas flow for two or more gases to be released from the gas outlet
Data Source
AI summary
A multi-line mass flow device configured for controlled delivery of two or more fluids into a process chamber. The multi-line mass flow device comprises a cluster mass flow control manifold and a multi-inlet manifold. The cluster mass flow control manifold comprises a controller, a gas manifold mounting block, and two or more gas flow control stations. The multi-inlet manifold comprises a multi-inlet mounting block, and two or more isolation valves mounted on the multi-inlet mounting block.