Cluster Nozzle Plasma Ionization for Gas Cluster Processing

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Solution Overview

Problem

Existing gas cluster processing techniques face limitations in efficiency and residue generation, with separate cluster generation and ionization units leading to complex and enlarged apparatus configurations, and the need for low-pressure vacuum environments, which restricts gas cluster ion generation and can result in insufficient processing times and residue formation.

Innovation Solution

A processing apparatus and method that integrates gas cluster generation and ionization within a single cluster nozzle using adiabatic expansion and plasma generation, where gas clusters are ionized by plasma in the nozzle and accelerated onto a workpiece, reducing apparatus complexity and avoiding low-pressure requirements, while using a magnet to trap charged components and control plasma generation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If gas clusters are ionized using a separate ionization unit, then ionized gas clusters can be generated, but the apparatus configuration becomes complex and enlarged

Engineering Contradiction:

Improveionized gas cluster generationVSAvoidapparatus configuration

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

The patent merges the ionization function into the cluster generation unit by introducing a plasma generation unit that generates plasma within the cluster generation unit. This integration eliminates the need for a separate ionization unit, resolving the contradiction between achieving reliable ionized gas cluster generation and maintaining simple apparatus configuration.

Inventive Principle:

Principle #5Merging (Combining)

2Reliability

If low-pressure vacuum environment is used for ionization, then ionized gas clusters can be generated, but processing time increases and residues may form

Engineering Contradiction:

Improveionized gas cluster generationVSAvoidprocessing time

Core Design Contradiction:

ReliabilityVSLoss of time

Solution Approach 1:

The patent changes the pressure parameter from low-pressure vacuum to atmospheric pressure by generating plasma directly within the cluster generation unit. This parameter change allows ionized gas cluster generation without requiring time-consuming vacuum pumping and maintains short processing times while preventing residue formation through effective plasma ionization.

Inventive Principle:

Principle #35Parameter changes

3Productivity

If atmospheric pressure is used for cluster generation, then cluster generation efficiency improves, but ionization becomes difficult

Engineering Contradiction:

Improvecluster generation efficiencyVSAvoidionization capability

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The patent introduces plasma as an intermediary mechanism that enables ionization at atmospheric pressure. The plasma generation unit creates a plasma environment within the cluster generation unit, which serves as a mediator that facilitates ionization of gas clusters without requiring low-pressure vacuum conditions, thus maintaining both high cluster generation efficiency and reliable ionization capability.

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances processing efficiency by increasing the physical energy of gas clusters, reduces residue generation, and allows for effective cleaning of substrates without the need for low-pressure environments, improving throughput and preventing residue formation.

Implementation Method 1

generate gas clusters by adiabatically expanding the cluster generating gas supplied from the gas supply unit therein

Methodology Applied

Scientific EffectAdiabatic expansion: Adiabatic Cooling

Implementation Method 2

a plasma generating mechanism that generates plasma in the cluster nozzle portion. The gas clusters are ionized by the plasma generated in the cluster nozzle portion

Methodology Applied

Scientific EffectPlasma generation: Plasma

Implementation Method 3

using a magnet to trap charged components and control plasma generation

Methodology Applied

Scientific EffectMagnetic field: Magnetic Field

Data Source

PatentUS11446714B2Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method

Publication Date: 2022.09.20 TOKYO ELECTRON LTD

AI summary

Disclosed is a processing apparatus for performing a processing on a workpiece using gas clusters. The processing apparatus includes: a processing container in which the workpiece is disposed, and an inside of which is maintained in a vacuum state; an exhaust mechanism that exhausts an atmosphere in the processing container; a gas supply unit that supplies a gas containing a cluster generating gas; a cluster nozzle provided in the processing container and configured to generate gas clusters by adiabatically expanding the cluster generating gas and inject a gas component containing the generated gas clusters into the processing container; and a plasma generating mechanism that generates plasma in the cluster nozzle portion. The gas clusters are ionized by the plasma generated in the cluster nozzle portion, and the ionized gas clusters are injected from the cluster nozzle and irradiated onto the workpiece, so that a predetermined processing is performed.