Clustered Heatmap Diagnostics for IC DRC Violations
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Solution Overview
Problem
The integrated circuit (IC) chip design process is hindered by extensive debugging tasks due to numerous design rule checking (DRC) errors, which require significant time and computer resources, especially when small-scale fixes lead to cascading changes, necessitating higher-level corrections in the hierarchical layout.
Innovation Solution
A method involving the generation of clustered heatmaps from DRC violations using a diagnostic model to identify specific DRC violation types and corresponding cell pairs, reducing the need for manual review and minimizing cascading changes by guiding corrections directly to affected cells.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If manual review of each DRC error is performed to identify causes, then debugging accuracy is improved, but time consumption and design cycle increase significantly
Solution Approach 1:
The patent introduces an intermediary system comprising error distribution analysis and heatmap generation that mediates between raw DRC errors and administrator review. The system generates visual heatmaps showing error concentrations, which guide administrators to high-priority areas without requiring review of every individual error, thus maintaining accuracy while reducing time loss.
Solution Approach 2:
The patent creates a visual copy (heatmap) of the error distribution across the IC layout. Instead of reviewing actual error data directly, administrators review the heatmap representation that copies and visualizes error patterns, enabling faster identification of problem areas while preserving debugging accuracy.
2Manufacturing precision
If small-scale fixes are made to correct DRC errors at physical level, then local error correction is achieved, but cascading changes propagate through the hierarchical layout requiring higher-level corrections
Solution Approach 1:
The patent segments the IC layout into hierarchical levels and error regions using heatmap analysis. By dividing the layout into manageable segments with concentrated errors identified through heatmaps, the system enables targeted corrections at appropriate hierarchical levels without propagating changes throughout the entire design, thus reducing cascading effects.
Solution Approach 2:
The patent applies local quality by generating heatmaps that identify specific regions with concentrated errors. This enables administrators to apply corrections with local precision to only the affected areas rather than making blanket changes across the entire layout, minimizing unnecessary modifications and cascading changes.
3Reliability
If comprehensive DRC validation is performed on the entire IC layout, then error detection completeness is improved, but computational resources and processing time increase
Solution Approach 1:
The patent applies partial action by performing DRC validation on the entire layout but then using heatmap analysis to identify and focus administrator attention only on regions with concentrated errors. The system performs complete validation for reliability but uses selective visualization to reduce the effective processing burden, allowing comprehensive error detection without proportionally increasing resource consumption for review.
Data Source
AI summary
A method for identifying design rule checking (DRC) violation types within an integrated circuit (IC) chip design includes receiving an IC chip design layout, and performing a DRC process on the IC chip design layout to identify DRC violations. Further, the method includes generating clustered heatmaps from heatmaps generated from the DRC violations. The method further includes identifying a first DRC violation type and a corresponding first cell pair within the IC chip design layout by analyzing the clustered heatmaps with a diagnostic model.