Coordinate Measuring Machine Calibration Using Semiconductor Masks

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Solution Overview

Problem

Current methods for calibrating coordinate measuring machines in the semiconductor industry require significant conversions and the use of special masks, which are costly and impractical, especially in the clean room environment, where precise positioning is essential but often damages existing mask holders and requires enlarging the machine's dimensions.

Innovation Solution

A method involving a semiconductor production mask with multiple structures, positioned on a three-point support, rotated, and shifted to determine an overall correction function that eliminates coordinate-dependent measuring errors using a first and second correction function to align measuring parameters across different orientations and positions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a calibration plate with grid points is used for self-calibration, then measurement precision is improved, but device complexity increases due to requiring multiple rotational positions and shifts

Engineering Contradiction:
Improvecoordinate measurement precisionVSAvoidcalibration procedure complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent extracts only the essential calibration features (three non-collinear points) from the complex grid plate approach, eliminating the need for multiple grid points and complex rotational positioning while maintaining calibration accuracy

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

Instead of rotating the calibration object multiple times as in prior art, the patent inverts the approach by using a statically positioned three-point support structure that defines the coordinate system directly, eliminating rotational operations

Inventive Principle:
Principle #13The other way round (Inversion)

2Reliability

If the measuring table dimensions are enlarged to accommodate calibration operations, then calibration reliability is improved, but loss of substance increases due to requiring additional space

Engineering Contradiction:
Improvecalibration reliabilityVSAvoidmeasuring table area
Core Design Contradiction:
ReliabilityVSLoss of substance

Solution Approach 1:

The patent makes the coordinate system definition dynamic by using a movable three-point support structure that can be positioned anywhere on the measuring table, eliminating the need for fixed large calibration plates and allowing calibration on the existing table area

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The three-point support structure serves as an intermediary that transfers the coordinate system definition from the measuring table to the calibration points, enabling calibration without requiring the table itself to be enlarged or modified

Inventive Principle:
Principle #24Intermediary (Mediator)

3Ease of operation

If existing mask holders are used for positioning, then ease of operation is improved, but manufacturing precision deteriorates due to damage to mask holders

Engineering Contradiction:
Improvemask positioning easeVSAvoidpositioning precision
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The patent uses a simple, replaceable three-point support structure that can be damaged or repositioned without affecting the expensive mask holders, effectively treating the support as a disposable or temporary component that protects the permanent fixtures

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The positioning function is segmented into two independent parts: the permanent mask holder and the temporary three-point support, allowing the support to be adjusted or replaced without affecting the mask holder integrity

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS7823295B2Method for calibration of a measuring table of a coordinate measuring machine
Publication Date: 2010.11.02 VISTEC SEMICON SYST
  • US7823295B2 patent drawing
  • US7823295B2 patent drawing
  • US7823295B2 patent drawing

AI summary

A method is disclosed which is suitable for the calibration of a measuring table (20) of a coordinate measuring machine (1). For this purpose, a mask (2) is deposited in a three-point support of the measuring table (20), wherein the mask (2) used for the calibration of the measuring table (20) is a mask (2), which is used for the semiconductor production. The measurement of positions of a plurality of different structures (3) which are arranged in a distributed manner on the mask (2) is carried out. The structures (3) are available in an initial orientation on the mask (2). The mask (2) is rotated and the position of the structures (3) is determined in the rotated orientation. Afterwards, the mask (2) is shifted and the position of the structures (3) is also determined. A total correction function for eliminating coordinate-dependant measuring errors is determined, wherein the total correction function has a first correction function and a second correction function.