CMOS Image Sensor Heterojunction Amplifier Noise Reduction

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Solution Overview

Problem

Conventional CMOS image sensors face challenges in reducing noise in photodiodes and amplifier transistors, limiting their sensitivity and dynamic range, especially in achieving photon counting with readout noise below 15 e−rms.

Innovation Solution

The use of a CMOS image sensor with a heterojunction amplifier transistor featuring a Ge layer and an SiGeSn layer as the channel region, which reduces noise by forming a high-quality quantum well structure without lattice mismatch defects, enabling readout noise of less than 0.15 e−rms and increased dynamic range.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-generated harmful factors

If conventional Si-MOSFETs are used for amplifier transistors, then device complexity is low and manufacturing is easy, but noise level remains high and readout noise cannot be reduced below 15 e−rms

Engineering Contradiction:
Improvenoise in amplifier transistorVSAvoidtransistor structure complexity
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The patent employs a heterojunction structure combining Ge and SiGeSn materials to form the amplifier transistor channel. This composite material approach creates a quantum well structure that suppresses noise while maintaining manufacturability through established semiconductor fabrication processes.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The invention changes the material composition parameters by introducing Sn into the SiGe layer to form SiGeSn, and adjusts the Ge/SiGeSn layer thickness ratio to optimize the quantum well effect. These parameter changes reduce noise while controlling device complexity.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If photodiode and amplifier transistor are formed on the same silicon substrate, then manufacturing process is simplified, but noise from both components cannot be reduced simultaneously to achieve photon counting sensitivity

Engineering Contradiction:
Improveintegration of photodiode and amplifierVSAvoidcombined noise from photodiode and amplifier
Core Design Contradiction:
Ease of manufactureVSObject-generated harmful factors

Solution Approach 1:

The patent applies local quality by forming the amplifier transistor with a special heterojunction structure in a specific region of the silicon substrate, while keeping the photodiode structure conventional. This localized optimization reduces amplifier noise without complicating the overall integrated manufacturing process.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration significantly reduces noise in CMOS image sensors, enabling photon counting and a substantial increase in dynamic range by utilizing the heterojunction between the SiGeSn and Ge substrates as the channel, outperforming traditional Si-MOSFETs.

Implementation Method 1

a heterojunction amplifier transistor having a Ge layer and an SiGeSn layer joined together as a channel region, and amplifies the electric signal resulting from conversion by the photoelectric conversion element

Methodology Applied
Scientific EffectQuantum well: Potential Well

Data Source

PatentUS10096641B2CMOS image sensor
Publication Date: 2018.10.09 KK TOSHIBA
  • US10096641B2 patent drawing
  • US10096641B2 patent drawing
  • US10096641B2 patent drawing

AI summary

According to one embodiment, a CMOS image sensor includes a photoelectric conversion element and an amplifier transistor. The photoelectric conversion element converts incident light into an electric signal. The amplifier transistor has a heterojunction in which a Ge layer and an SiGeSn layer are joined together, as a channel region and amplifies the electric signal resulting from conversion by the photoelectric conversion element.