CMOS Image Sensor Channel Stop Region RTS Noise Reduction

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Solution Overview

Problem

CMOS image sensors face significant random telegraph signal (RTS) noise due to charge trap/de-trap in shallow trench isolation (STI) edges, which reduces sensitivity and is difficult to mitigate without increasing transistor size.

Innovation Solution

The semiconductor device minimizes STI edges by incorporating a channel stop region with a different conductivity type, reducing RTS noise by hindering current flow in edge regions and increasing voltage threshold, thus reducing noise without enlarging the transistor.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If shallow trench isolation (STI) is used for transistor isolation, then device integration is enabled, but RTS noise increases due to charge trap/de-trap at STI edges

Engineering Contradiction:
Improvedevice integrationVSAvoidRTS noise
Core Design Contradiction:
ProductivityVSObject-generated harmful factors

Solution Approach 1:

The patent applies local quality by creating a channel stop region with different conductivity type (opposite to the channel region) at specific locations adjacent to the STI structure. This localized modification of electrical properties eliminates charge trap/de-trap effects at the STI edge without requiring removal of the STI isolation structure itself, thus maintaining device integration while reducing RTS noise

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent converts the harmful STI edge structure into a beneficial configuration by introducing a channel stop region with opposite conductivity type. This transformation changes the electrical behavior at the STI interface, turning the previously harmful charge trap region into a controlled channel termination that prevents carrier accumulation and reduces RTS noise

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

2Object-generated harmful factors

If transistor size is increased to reduce RTS noise, then noise reduction is achieved, but device area increases

Engineering Contradiction:
ImproveRTS noiseVSAvoidtransistor area
Core Design Contradiction:
Object-generated harmful factorsVSArea of stationary object

Solution Approach 1:

The patent applies parameter changes by modifying the conductivity type parameter of the channel stop region (making it opposite to the channel region). This parameter change fundamentally alters the electrical characteristics at the channel-STI interface, enabling RTS noise reduction through electrical field control rather than geometric scaling, thus avoiding increased transistor area

Inventive Principle:
Principle #35Parameter changes

3Object-generated harmful factors

If channel stop region with opposite conductivity type is introduced, then RTS noise is reduced by hindering current flow in edge regions, but device complexity increases

Engineering Contradiction:
ImproveRTS noiseVSAvoidtransistor structure
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The patent applies segmentation by dividing the channel region into distinct segments: the main channel region and the channel stop region with opposite conductivity type. This segmentation creates clear functional zones where the channel stop region acts as a barrier to carrier flow at the STI interface, enabling precise control of current flow paths and reduction of RTS noise through spatial separation of functional regions

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively reduces RTS noise in CMOS image sensors, enhancing sensitivity without the need for larger transistors, thereby improving image sensor performance.

Implementation Method 1

a first channel stop region on a first side of the first channel region, the first channel stop region having a second conductivity type that is different from the first conductivity type

Methodology Applied
Scientific EffectElectrical Resistance: Electrical Resistance

Data Source

PatentUS10367024B2Semiconductor image sensors having channel stop regions and methods of fabricating the same
Publication Date: 2019.07.30 SAMSUNG ELECTRONICS CO LTD
  • US10367024B2 patent drawing
  • US10367024B2 patent drawing
  • US10367024B2 patent drawing

AI summary

A semiconductor device includes a light-receiving element which outputs electric charges in response to incident light, and a drive transistor which is gated by an output of the light-receiving element to generate a source-drain current in proportion to the incident light, wherein the drive transistor include a first gate electrode, a first channel region which is disposed under the first gate electrode, first source-drain regions which are disposed at respective ends of the first channel region and that have a first conductivity type, and a first channel stop region which is disposed on a side of the first channel region, and that separates the light-receiving element and the first channel region, the first channel stop region having a second conductivity type that is different from the first conductivity type.