CMP Brush Cleaning With Electric Field Particle Removal
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Solution Overview
Problem
Chemical mechanical polishing processes using ceria abrasive face challenges in effectively removing particles from brushes after the CMP process, as existing methods may re-adsorb contaminants, leading to re-contamination of wafers and potential corrosion from cleaning solutions like Peracid.
Innovation Solution
A brush cleaning device with embedded electrodes in both the brush and platen, creating an electrical field to attract and remove particles, utilizing a cylindrical body with protrusions and pores, and a particle collection system to efficiently separate and discharge contaminants, preventing re-adsorption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional cleaning methods are used to remove particles from brushes, then cleaning is performed, but particles are re-adsorbed onto the brush causing re-contamination
Solution Approach 1:
The patent replaces conventional mechanical cleaning methods with an electrical field-based cleaning system. Electrodes embedded in the brush and platen generate an electrical field that electrostatically attracts and removes particles from the brush surface, preventing re-adsorption that occurs with mechanical cleaning methods.
Solution Approach 2:
The patent changes the cleaning mechanism from mechanical contact to electrical field interaction. By applying voltage to the electrodes, the system creates controllable electrical field strength parameters that optimize particle removal while preventing re-adsorption, addressing the limitations of conventional mechanical cleaning.
2Reliability
If strong cleaning solutions like Peracid are used to remove particles, then particle removal is achieved, but corrosion damage occurs
Solution Approach 1:
The patent substitutes chemical cleaning methods with an electrical field-based cleaning system. By using electrodes to generate electrical fields that electrostatically attract particles, the system achieves effective particle removal without the corrosion damage caused by strong chemical cleaning solutions like Peracid.
3Ease of manufacture
If the brush structure is simplified for ease of manufacture, then manufacturing is easier, but particle collection efficiency decreases
Solution Approach 1:
The patent incorporates a porous layer in the brush structure that maintains manufacturing simplicity while significantly improving particle collection efficiency. The porous structure provides increased surface area and multiple pathways for particle collection through the electrical field, resolving the contradiction between manufacturing ease and collection efficiency.
4Productivity
If electrodes are embedded in the brush and platen to create electrical field, then particle removal efficiency improves, but device complexity increases
Solution Approach 1:
The patent designs the electrodes to serve multiple functions: they generate the electrical field for particle removal, provide structural support within the brush and platen, and enable controllable cleaning intensity through voltage adjustment. This multi-functionality reduces overall device complexity despite adding electrode components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Efficiently removes particles from brushes post-CMP, preventing re-contamination and minimizing damage to wafers, while allowing for self-cleaning of the brush, regardless of the abrasive type or cleaning solution used.
Implementation Method 1
a voltage supplier having an electrode interacting with the electrode of the brush, and supplying a voltage to form an electrical field on the brush and the platen
Implementation Method 2
the platen having an electrode therein that generates an attractive force or a repulsive force
Data Source
AI summary
A brush cleaning device includes a brush including an electrode therein; a cleaning tank in which the brush is accommodatable; a platen in the cleaning tank, the platen being spaced apart from the brush, and including an electrode therein that interacts with the electrode of the brush; and a voltage supplier having an electrode interacting with the electrode of the brush, and supplying a voltage to form an electrical field on the brush and the platen, wherein the brush includes a cylindrical body including a plurality of protrusions on a surface thereof, and pores in at least a portion of the plurality of protrusions; a particle collection pipe at a center of the cylindrical body; and a particle suction pipe in fluid communication with the particle collection pipe and extending radially to the pores at an outer surface of the brush.