CMP Chemical Mixing Control for Precise Concentration and pH
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Solution Overview
Problem
Existing chemical solution preparation systems for semiconductor cleaning devices face challenges in accurately diluting high-concentration chemical solutions to achieve the required concentration and pH values for effective cleaning.
Innovation Solution
A chemical solution preparation system comprising multiple mixing systems that combine different chemical solutions and diluents according to preset ratios, with an output system for spraying the mixture onto semiconductor products, a sampling system for monitoring the mixture's properties, and a monitoring system for ensuring the mixture meets cleaning requirements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If high-concentration chemical solutions are used for cleaning semiconductor products, then cleaning effectiveness is improved, but the solution cannot satisfy the required concentration and pH values for safe and effective cleaning
Solution Approach 1:
The chemical solution is divided into multiple components stored in separate tanks (first chemical solution tank, second chemical solution tank, third chemical solution tank, and diluent tank). Each component is independently controlled and then precisely mixed in predetermined ratios to achieve the target concentration and pH values, resolving the contradiction between having high cleaning effectiveness and maintaining precise concentration control.
Solution Approach 2:
The system incorporates monitoring devices that detect the concentration and pH values of the chemical solution in real-time. This feedback mechanism allows the system to adjust the mixing ratios dynamically to maintain the required precision, thereby achieving both high cleaning effectiveness and accurate concentration/pH control.
2Manufacturing precision
If multiple chemical solutions are mixed to achieve required concentration and pH values, then cleaning precision is improved, but the system complexity increases
Solution Approach 1:
The mixing system uses a unified mixing chamber that can accommodate multiple chemical solution inputs and diluent inputs simultaneously. This multi-functional mixing apparatus reduces the need for separate mixing systems for each chemical solution, thereby managing complexity while maintaining precise concentration and pH control.
Solution Approach 2:
The system introduces a central control unit that acts as an intermediary to manage the complex mixing process. This control unit coordinates the flow rates and mixing ratios of multiple chemical solutions and diluents, simplifying the overall system operation while achieving precise concentration and pH value control.
3Manufacturing precision
If real-time monitoring of chemical solution composition is implemented, then cleaning quality is improved, but the system cost and complexity increase
Solution Approach 1:
The monitoring system provides real-time feedback on the concentration and pH values of the chemical solution. This feedback is integrated into the control system, allowing automatic adjustments to be made without requiring complex manual intervention, thereby improving cleaning quality while managing system complexity through automation.
Solution Approach 2:
The system incorporates self-diagnostic and self-adjustment capabilities where the monitoring devices automatically detect deviations in concentration or pH values and trigger corrective actions without external intervention. This reduces the operational complexity while maintaining high cleaning quality through continuous real-time monitoring.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures precise control over chemical solution composition, improving the accuracy of semiconductor cleaning and enhancing product yield by maintaining optimal concentration and pH values.
Implementation Method 1
Because a concentration of a chemical solution is relatively high, the chemical solution needs to be diluted to satisfy a required concentration or pH value
Implementation Method 2
Deionized water and a mixture of chemical solutions are simultaneously sprayed from a spray pipe on the chemical solution cleaning device to the semiconductor product
Implementation Method 3
the chemical solution needs to be diluted to satisfy a required concentration or pH value, so as to clean a corresponding semiconductor product
Data Source
AI summary
The present disclosure provides a chemical solution preparation system and method. The chemical solution preparation system includes: a first mixing system, configured to mix a first chemical solution and a first diluent to obtain a first mixture; a second mixing system, configured to mix a second chemical solution and a second diluent to obtain a second mixture; a third mixing system, configured to mix the first mixture, the second mixture, and a third diluent to obtain a third mixture; an output system, configured to output the third mixture to a spray apparatus of the chemical mechanical polishing device; a sampling system, configured to collect a sample of the third mixture output from the output system; and a monitoring system, configured to monitor a status of the first mixture, a status of the second mixture, and a status of the third mixture.