CMP Cleaning Agent Kit for Long-Storage Impurity Removal
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Solution Overview
Problem
Existing cleaning agents for semiconductor substrates after chemical mechanical polishing (CMP) process lose effectiveness in removing impurities over time, leading to reduced performance after long-term storage.
Innovation Solution
A cleaning agent kit comprising a first liquid with a compound showing acidic properties, represented by Formula (1), and a second liquid with a basic compound, used to prepare a cleaning agent with a pH of 8 to 14, which maintains impurity removal performance even after long-term storage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If a cleaning agent is stored for a long period of time, then the cleaning agent is ready for use, but the performance of removing foreign matter from the semiconductor substrate surface lowers
Solution Approach 1:
The cleaning agent is divided into two separate liquids (first liquid with compound of Formula (1) and second liquid with basic compound) that are stored separately and mixed immediately before use. This segmentation prevents the degradation reaction between acidic and basic components during storage, maintaining the cleaning performance even after long-term storage.
Solution Approach 2:
The cleaning components are prepared in advance but kept in a stable, non-reactive state as separate liquids. The actual cleaning action is activated only when the two liquids are mixed immediately before application, ensuring maximum effectiveness while allowing long-term storage of the individual components.
2Reliability
If the cleaning agent contains both acidic compound and basic compound, then the cleaning performance is enhanced, but the stability of the cleaning agent during storage deteriorates
Solution Approach 1:
The acidic compound (Formula (1)) and basic compound are separated into two distinct liquids, preventing their direct interaction and maintaining compositional stability during storage. The enhanced cleaning performance is achieved by combining these components immediately before use, allowing both high performance and long-term stability.
Solution Approach 2:
The patent introduces a separation system where the two reactive components are kept in separate containers, acting as intermediaries that prevent direct contact between the acidic and basic compounds during storage, thereby maintaining stability while preserving the ability to generate high cleaning performance when needed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The cleaning agent kit ensures the maintenance of impurity removal performance on semiconductor substrates even after long-term storage, providing effective cleaning and preventing corrosion.
Implementation Method 1
a first liquid containing a compound represented by Formula (1) described below and showing acidic properties; and a second liquid containing a basic compound and showing alkaline properties
Data Source
AI summary
The present invention addresses the problem of providing a kit for a cleaning agent, which is used for the purpose of preparing a cleaning agent that maintains, even after long-term storage, adequate impurity removal performance from the surface of a semiconductor substrate that has been subjected to a CMP process. The present invention also addresses the problem of providing a method for preparing the above-described cleaning agent. A kit for a cleaning agent according to the present invention is a kit for preparing a cleaning agent which is used for cleaning of a semiconductor substrate that has been subjected to a CMP process, and which has a pH of from 7.5 to 13.0. This kit for a cleaning agent comprises a first liquid that is acidic and contains a compound represented by formula (1) and a second liquid that is alkaline and contains a basic compound; and an acidic compound is contained in at least one of the first liquid and the second liquid.