CMP Head Peripheral Diversion Openings for Pressure Uniformity
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Solution Overview
Problem
Conventional CMP heads exhibit uneven pressure distribution due to the absence of openings in the peripheral region, leading to the 'fast band effect' which results in non-uniform material layer polishing, affecting the yield and reliability of semiconductor devices.
Innovation Solution
A CMP head design featuring a disk-shaped membrane support with a ventilator in the central region and diversion openings in the peripheral region, which alters the gas flow path to equalize pressure and prevent the fast band effect.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If ventilators are formed only in the central region of the membrane support, then the structure is simple, but the pressure distribution becomes uneven causing fast band effect
Solution Approach 1:
The membrane support is divided into central region and peripheral region with different opening configurations. The central region has ventilators while the peripheral region has diversion openings, creating segmented functional zones that address different pressure distribution needs in each region.
Solution Approach 2:
Different regions of the membrane support are given different properties: the central region has ventilators for gas supply while the peripheral region has diversion openings for pressure equalization. This local differentiation resolves the pressure unevenness without requiring complete structural redesign.
2Manufacturing precision
If diversion openings are added in the peripheral region, then the pressure distribution becomes uniform, but the device complexity increases
Solution Approach 1:
The membrane support is divided into central region and peripheral region with different opening configurations. The central region has ventilators while the peripheral region has diversion openings, creating segmented functional zones that address different pressure distribution needs in each region.
Solution Approach 2:
Different regions of the membrane support are given different properties: the central region has ventilators for gas supply while the peripheral region has diversion openings for pressure equalization. This local differentiation resolves the pressure unevenness without requiring complete structural redesign.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The diversion openings in the peripheral region of the CMP head improve the uniformity of the material layer thickness, enhancing the reliability and yield of semiconductor devices by distributing pressure evenly during the polishing process.
Implementation Method 1
gas is implanted into the CMP head through the ventilator 58 and the diversion opening 60, the membrane 70 is expanded
Implementation Method 2
The flexible membrane 22 is pushed by the implanted gas and extends outwardly, thereby bringing pressure upon the wafer 18
Data Source
AI summary
A CMP head includes a membrane support and a membrane. The membrane support is disk-shaped, having an origin and a radius R. The membrane support has at least a ventilator disposed in a central region within the range between origin and (⅔) R, and at least a diversion opening disposed in a peripheral region within the range between (⅔) R and R. The membrane includes a disk-shaped part disposed on the first surface of the membrane support, and an annular part surrounding the annular sidewall of the membrane support.