CMP Pad Conditioning Using Aerosol Spray Instead of Diamond Tips

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Existing substrate polishing methods, particularly chemical mechanical polishing (CMP), face issues with deterioration of conditioning capability due to abrasion of diamond tips, uneven conditioning distribution, and process defects from dislodged diamond tips, leading to reduced productivity in semiconductor manufacturing.

Innovation Solution

A substrate polishing apparatus utilizing an aerosol-based conditioning device that includes a supplier and sprayer to generate and spray aerosol onto the polishing pad, eliminating the need for diamond tip disks, thereby maintaining conditioning capability and improving distribution consistency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If diamond tip disks are used for conditioning the polishing pad, then the polishing pad can be conditioned to maintain polishing performance, but the diamond tips undergo abrasion leading to deterioration of conditioning capability and generation of process defects

Engineering Contradiction:

Improveconditioning capabilityVSAvoidmanufacturing efficiency

Core Design Contradiction:

ReliabilityVSProductivity

Solution Approach 1:

The patent removes the diamond tip disk from the conditioning system and replaces it with an aerosol delivery system. The harmful diamond tips are extracted entirely, eliminating abrasion-related deterioration while maintaining the conditioning function through alternative means (aerosolized conditioning agents).

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the mechanical abrasion-based conditioning system (diamond tip disks) with an aerosol-based chemical/physical conditioning system. The mechanical action of diamond tips is substituted by aerosolization and deposition of conditioning agents, eliminating mechanical wear and tear.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If diamond tip disks are used for conditioning, then polishing performance can be maintained, but uneven conditioning distribution occurs and diamond tips become dislodged causing process defects

Engineering Contradiction:

Improvepolishing qualityVSAvoidprocess defects

Core Design Contradiction:

Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent eliminates the source of harmful factors by removing the diamond tip disk entirely. The aerosol system delivers conditioning agents without generating dislodged particles, thereby eliminating process defects caused by diamond tip deterioration while maintaining polishing quality.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent changes the state of the conditioning medium from solid (diamond tips) to aerosol (fine particles or droplets in gas phase). This parameter change enables uniform distribution of conditioning agents throughout the polishing pad surface, eliminating uneven conditioning while preventing particle dislodgement.

Inventive Principle:

Principle #35Parameter changes

3Duration of action of stationary object

If conventional conditioning methods are used, then the polishing pad can be conditioned, but abrasion of diamond tips leads to reduced durability and productivity

Engineering Contradiction:

ImprovedurabilityVSAvoidmanufacturing efficiency

Core Design Contradiction:

Duration of action of stationary objectVSProductivity

Solution Approach 1:

The patent replaces the mechanical abrasion system with an aerosol delivery system that does not involve mechanical contact. This substitution eliminates wear and tear on conditioning elements, significantly improving durability while maintaining or enhancing productivity through more efficient conditioning.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the physical state and delivery mechanism of conditioning agents from solid diamond tips to aerosol form. This parameter change enables longer-lasting conditioning without mechanical degradation, improving durability and allowing for more efficient manufacturing processes.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The aerosol-based conditioning enhances the polishing apparatus's durability and productivity by preventing diamond tip abrasion-related issues, ensuring consistent conditioning and reducing process defects, thus improving semiconductor manufacturing efficiency.

Implementation Method 1

a sprayer connected to the supplier and configured to generate aerosol from the source material

Methodology Applied

Scientific EffectAerosol: Aerosol

Data Source

PatentUS20260054348A1Substrate polishing apparatus, method for manufacturing semiconductor device including the same, and method for conditioning the substrate polishing apparatus

Publication Date: 2026.02.26 SAMSUNG ELECTRONICS CO LTD

AI summary

Provided is a substrate polishing apparatus including a polishing pad, a head portion configured to move a substrate to contact the polishing pad, and a conditioning device on the polishing pad in a vertical direction and spaced apart from the polishing pad, wherein the conditioning device includes a supplier configured to produce a source material, and a sprayer connected to the supplier and configured to generate aerosol from the source material, and wherein the sprayer includes a low pressure chamber, and a spray nozzle configured to spray the aerosol to the polishing pad.