CMP Pad Wear Detection via Torque Monitoring

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Solution Overview

Problem

Chemical mechanical polishing (CMP) processes face challenges in detecting uneven wear of polishing pads, leading to reduced polishing rate and planarization quality due to air bubbles and uneven wear patterns, which can cause premature pad replacement and affect substrate finish.

Innovation Solution

A polishing apparatus equipped with sensors to detect rotation speed, torque, and swing torque of the polishing and dressing units, calculating change quantities and issuing warnings when thresholds are exceeded to determine appropriate pad replacement timing, thereby addressing uneven wear and extending pad service life.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Duration of action of stationary object

If the polishing pad is used for an extended period to increase productivity, then the service life of the polishing pad is improved, but uneven wear occurs leading to reduced polishing precision and planarization quality

Engineering Contradiction:
Improveservice life of polishing padVSAvoidpolishing planarization quality
Core Design Contradiction:
Duration of action of stationary objectVSManufacturing precision

Solution Approach 1:

The system performs preliminary detection of polishing pad wear state through torque monitoring before uneven wear significantly impacts polishing quality. By continuously monitoring the torque during dressing operations and comparing it against reference values, the system can identify early signs of uneven wear and trigger pad replacement before manufacturing precision deteriorates.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system establishes a feedback loop where torque values during dressing operations are continuously measured, compared against reference torque values obtained when the polishing pad is in good condition, and used to determine when pad replacement is necessary. This feedback mechanism enables the system to maintain high polishing precision throughout the pad's service life by triggering replacement at the optimal moment.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If the polishing pad is replaced more frequently to maintain polishing quality, then the manufacturing precision is improved, but the productivity is reduced due to increased replacement operations

Engineering Contradiction:
Improvepolishing planarization qualityVSAvoidsubstrate polishing output
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The system uses continuous torque monitoring during dressing operations to provide real-time feedback on polishing pad condition. By comparing measured torque values against reference values, the system can precisely determine when pad replacement is actually needed, avoiding both premature replacement (which reduces productivity) and delayed replacement (which reduces precision).

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system replaces manual inspection and judgment-based pad replacement decisions with an automated sensor-based torque monitoring system. This substitution of mechanical/operational processes with sensor-based detection enables more accurate and timely pad replacement decisions, optimizing the balance between precision and productivity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If the dressing operation is performed more frequently to prevent uneven wear, then the polishing precision is maintained, but the loss of time increases due to additional dressing cycles

Engineering Contradiction:
Improvepolishing uniformityVSAvoidtime for dressing operations
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The system monitors torque values during each dressing operation and provides feedback on the actual wear state of the polishing pad. This enables determination of the optimal dressing frequency based on actual pad condition rather than fixed schedules, reducing unnecessary dressing operations that consume time while still maintaining polishing precision when needed.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system changes the operational parameters by using torque values as a dynamic indicator of pad wear state. Instead of following a fixed dressing schedule, the system adjusts dressing frequency based on actual torque measurements, allowing optimization of the balance between maintaining polishing uniformity and minimizing time loss.

Inventive Principle:
Principle #35Parameter changes

4Measurement precision

If the torque monitoring sensitivity is increased to detect uneven wear earlier, then the detection precision is improved, but false alarms increase leading to unnecessary pad replacements

Engineering Contradiction:
Improvewear detection accuracyVSAvoidpad replacement decision reliability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The system uses feedback from multiple torque measurements during different dressing operations to establish reliable reference values and detection thresholds. By analyzing torque trends and comparing against statistically derived reference ranges, the system can distinguish between normal torque variations and actual signs of uneven wear, reducing false alarms while maintaining high detection precision.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system performs multiple torque measurements during dressing operations rather than relying on a single measurement. This partial repetition of the detection process allows for statistical analysis and filtering of outlier values, improving the reliability of wear detection while maintaining high measurement precision through aggregated data.

Inventive Principle:
Principle #16Partial or excessive action

Data Source

PatentUS9530704B2Polishing apparatus and wear detection method
Publication Date: 2016.12.27 EBARA CORP
  • US9530704B2 patent drawing
  • US9530704B2 patent drawing
  • US9530704B2 patent drawing

AI summary

There is provided a polishing apparatus capable of detecting uneven wear occurring on a polishing pad and detecting an appropriate replacement timing of the polishing pad. The polishing apparatus detects, every predetermined time, a value of rotation speed or a value of rotation torque of a table drive shaft for rotationally driving a polishing table or a dresser drive shaft for driving a dresser, or a value of swing torque of a dresser swing shaft for driving the dresser; calculates a change quantity thereof based on the value of the detected rotation speed, the value of the detected rotation torque, or the value of the detected swing torque; determines whether or not the change quantity exceeds a predetermined value; and notifies a user of a warning when a determination is made that the change quantity exceeds the predetermined value.