CMP Polishing Pad Window Sealing via Pre-Aligned Adhesive Layers
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Solution Overview
Problem
The existing polishing pads for chemical mechanical planarization (CMP) processes suffer from leakage due to gaps between the polishing layer and the window block, necessitating a solution for improved gas tightness.
Innovation Solution
A polishing pad design featuring a polishing layer with a first penetrating hole, a support layer with a second penetrating hole, and adhesive layers with corresponding holes, where the window is inserted and adhered with a second adhesive layer to ensure alignment and secure bonding, preventing leakage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a window block is inserted into a polishing pad to enable optical measurement, then the ability to measure wafer thickness is improved, but gas tightness deteriorates due to gaps between the polishing layer and window block
Solution Approach 1:
Penetrating holes are pre-formed in the polishing layer, adhesive layer, and support layer before window insertion. This preliminary preparation ensures precise alignment and eliminates gaps that would compromise gas tightness during CMP operation.
Solution Approach 2:
An adhesive layer with a penetrating hole is introduced as an intermediary between the polishing layer and support layer. This adhesive layer bonds the window block securely while maintaining alignment, preventing gas leakage without compromising the optical measurement function.
2Measurement precision
If a window is inserted into the polishing pad to detect termination point, then the detection capability is improved, but leakage occurs due to poor sealing between components
Solution Approach 1:
Penetrating holes are pre-formed in all layers (polishing layer, adhesive layer, support layer) before assembly. This ensures precise alignment of the window block with the underlying structures, eliminating misalignment-induced leakage paths.
Solution Approach 2:
The adhesive layer serves as a mediator that bonds the window block to the support layer while accommodating slight dimensional variations. This intermediate bonding layer seals the interface, preventing slurry or gas leakage while maintaining the optical detection function.
3Stability of the object's composition
If multiple layers with penetrating holes are assembled to integrate the window, then the structural integration is improved, but alignment precision deteriorates leading to gaps
Solution Approach 1:
Penetrating holes are pre-formed in the polishing layer, adhesive layer, and support layer before assembly. This preliminary preparation ensures precise alignment is achieved during assembly, preventing gaps that would compromise both structural integrity and gas tightness.
Solution Approach 2:
The adhesive layer with a penetrating hole acts as a flexible intermediary that accommodates minor misalignments between the polishing layer and support layer. This intermediate layer bonds the components together while compensating for alignment variations, maintaining both structural integration and sealing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design achieves excellent gas tightness, effectively preventing leakage during the CMP process by ensuring a secure and sealed integration of the window, enhancing the accuracy of optically detecting the termination point and reducing damage to the light transmission region.
Implementation Method 1
a first adhesive layer interposed between the polishing layer and the support layer... a second adhesive layer adhered to a side of the window... a part of the peripheral region of the second adhesive layer and the first adhesive layer are adhered to each other
Data Source
AI summary
An embodiment relates to a polishing pad which is used in a chemical mechanical planarization (CMP) process and has excellent airtightness, wherein the polishing pad is excellent in airtightness of a window opening and thus can prevent water leakage that may occur during a CMP process.