Vinyl-Based CMP Polymer with Ether Side Chains for Storage Stability
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Solution Overview
Problem
The hydrolyzability of ester bonds in (meth)acrylic acid ester-based polymers used in polishing liquids leads to changes in characteristics during storage, affecting processing accuracy in semiconductor manufacturing.
Innovation Solution
A vinyl-based polymer with structural units derived from specific vinyl-based monomers, including a structural unit (A) and optionally a structural unit (B), produced through living radical polymerization, which enhances storage stability and is used in a polishing liquid with abrasive grains for semiconductor processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If (meth)acrylic acid ester-based polymer is used in polishing liquid, then polishing performance is improved, but storage stability deteriorates due to hydrolyzability of ester bonds
Solution Approach 1:
The patent changes the chemical structure parameter of the polymer by replacing ester bonds with ether bonds in the side chains. This structural parameter change eliminates hydrolyzability while maintaining water solubility and polishing performance, thus resolving the contradiction between storage stability and processing accuracy
Solution Approach 2:
The patent creates a composite polymer structure combining a polyacrylic acid backbone with polyether side chains. This composite structure integrates the benefits of both components: the backbone provides polishing performance while the side chains provide storage stability by preventing hydrolysis
2Productivity
If polymer with higher molecular weight is used to improve removal rate, then productivity increases, but dishing suppression capability decreases
Solution Approach 1:
The patent optimizes the molecular weight parameter to a specific range (1,000 to 1,000,000, preferably 10,000 to 100,000) and controls dispersity (PDI ≤ 2.0). This parameter optimization achieves a balance where the polymer is light enough to suppress dishing by forming removable films but heavy enough to maintain removal rate through effective surface coverage
3Manufacturing precision
If polymer concentration is increased to improve surface coverage, then manufacturing precision improves, but viscosity increases reducing ease of operation
Solution Approach 1:
The patent optimizes the concentration parameter to a specific range (0.01 to 10% by mass, preferably 0.1 to 5%). This concentration optimization ensures sufficient surface coverage for polishing precision while maintaining low enough viscosity for easy application and flow during the polishing process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The vinyl-based polymer provides excellent storage stability and processing accuracy, suppressing dishing and maintaining removal rates in semiconductor polishing, with controlled molecular weight and dispersity for effective surface polishing.
Implementation Method 1
a vinyl-based polymer containing a structural unit (A) derived from a vinyl-based monomer (A) represented by the following structural formula (1)... excellent storage stability... suppressing dishing and maintaining removal rates in semiconductor polishing
Data Source
AI summary
A vinyl-based polymer contains a structural unit (A) derived from a vinyl-based monomer (A) represented by the following structural formula (1). In the structural formula (1), R represents a hydrogen atom or a methyl group, W represents a divalent hydrocarbon group having 6 or less carbon atoms, X represents a heteroatom-containing divalent functional group having 1 or less carbon atoms, Y represents a divalent hydrocarbon group having 6 or less carbon atoms, Z represents a hydrogen atom or an alkyl group having 1 or more and 4 or less carbon atoms, and n represents an integer of 4 or more. The vinyl-based polymer is obtained, for example, by polymerizing one or more types of vinyl-based monomers including the vinyl-based monomer (A) by a living radical polymerization method.