CMP Slurry Filter Assembly With Spiral Sweeping Flow
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Solution Overview
Problem
Vertical filtration systems in chemical mechanical polishing (CMP) face challenges with low filtration efficiency and particle diameter bottlenecks due to the introduction of large particles into the filter element, leading to blockage and reduced performance.
Innovation Solution
A spiral sweeping flow field is generated in the filtration apparatus using specific inlet and outlet positions to eliminate vertical flow, leveraging centrifugal force to remove large particles outward, enhancing filtration efficiency and extending the service life of the filter element.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If vertical filtration is used in CMP slurry, then filtration is performed, but large particles are introduced into the filter element causing blockage and reduced filtration efficiency
Solution Approach 1:
The patent inverts the conventional vertical flow direction by implementing a horizontal flow path where slurry enters through side inlets and exits through side outlets, preventing large particles from being forced into the filter element while maintaining effective filtration of polishing particles
Solution Approach 2:
The patent transitions from vertical one-dimensional flow to horizontal three-dimensional flow with multiple inlet and outlet positions, creating a sweeping flow pattern that removes large particles through centrifugal force while maintaining filtration efficiency
2Object-affected harmful factors
If filter element captures large particles, then particle removal occurs, but filter element service life is reduced due to blockage
Solution Approach 1:
The patent extracts large particles from the slurry flow before they can enter the filter element by using horizontal side inlets and outlets positioned to create a sweeping flow that carries large particles away from the filter element, preventing blockage while maintaining particle removal capability
Solution Approach 2:
The patent performs preliminary separation of large particles through the horizontal sweeping flow field before the slurry reaches the filter element, preventing future blockage and extending filter element service life
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The spiral sweeping flow field effectively removes large particles from the filtration apparatus, improving filtration efficiency and extending the service life of the filter element by preventing blockage and ensuring consistent performance.
Implementation Method 1
A spiral sweeping flow field is generated in the filtration apparatus using specific inlet and outlet positions to eliminate vertical flow, leveraging centrifugal force to remove large particles outward
Data Source
AI summary
A method is provided. The method includes: flowing chemical mechanical polishing (CMP) slurry into a filter assembly, the filter assembly including a filter element extending along a filter element axis, the flowing being via an inlet defined in a body of the filter assembly and located at a first location adjacent a first end of the filter element, the inlet extending along an inlet axis non-parallel to the filter element axis; and after flowing the CMP slurry into the filter assembly, flowing the CMP slurry out of the filter assembly via a first outlet, the first outlet defined in the body of the filter assembly and located at a second location adjacent a second end of the filter element, the first outlet extending along a first outlet axis non-parallel to the filter element axis.