Carbon Nanotube Photolithography Mask for Nanoscale Pattern Accuracy
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Solution Overview
Problem
Current photolithography mask materials, such as plastic, glass, and patterned metal, result in microstructures with low dimensional accuracy, making it difficult to achieve microstructures in the nanoscale.
Innovation Solution
A photolithography mask plate comprising a second substrate and a composite layer with a carbon nanotube layer sandwiched between the cover layer and the substrate, which allows for precise ultraviolet light absorption and transmission, enabling the creation of patterned photoresist microstructures with improved dimensional accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional mask materials (plastic, glass, patterned metal) are used, then the process is simple and easy to operate, but the dimensional accuracy of microstructures is low
Solution Approach 1:
The patent uses a composite mask plate structure consisting of a substrate and a carbon nanotube layer. The carbon nanotube layer is formed by chemical vapor deposition and patterned to create precise microstructures. This composite structure combines the mechanical support of the substrate with the precise light-absorbing properties of carbon nanotubes, achieving high dimensional accuracy while maintaining ease of operation.
Solution Approach 2:
The patent changes the material parameter from conventional plastics/glasses to carbon nanotubes, which have superior light absorption properties and dimensional stability. The carbon nanotube layer thickness and pattern dimensions are precisely controlled during deposition to achieve the desired microstructure accuracy.
2Manufacturing precision
If conventional mask materials are used, then the process is simple, but it is difficult to obtain microstructures in nanoscale
Solution Approach 1:
The patent replaces mechanical patterning methods with chemical vapor deposition followed by photolithographic patterning. The carbon nanotube layer is deposited chemically and then patterned using light exposure through a photomask, enabling nanoscale precision that cannot be achieved with conventional mechanical or thermal methods.
Solution Approach 2:
The patent utilizes the unique optical properties of carbon nanotubes, which have strong light absorption in the ultraviolet range. This allows for precise photolithographic patterning at nanoscale dimensions, as the carbon nanotube layer provides excellent contrast and definition during the exposure process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The carbon nanotube-based mask plate enhances the precision of microstructure creation, allowing for the production of micro-nanostructures with consistent patterns and high accuracy, suitable for various applications, including optical devices.
Implementation Method 1
wherein the ultraviolet light reach the photoresist layer through the second substrate and the composite layer
Data Source
AI summary
A method of making photolithography mask plate is provided. The method includes: providing a carbon nanotube composite structure, wherein the carbon nanotube composite structure comprises a carbon nanotube layer and a chrome layer coated on the carbon nanotube layer; locating the carbon nanotube composite structure on a substrate to expose partial surfaces of the substrate; and depositing a cover layer on the carbon nanotube composite structure.