Carbon Nanotube Metal Oxide TFT for High Mobility Quantum Dot Displays

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Solution Overview

Problem

Conventional thin film transistors, such as amorphous silicon TFTs, fail to meet the mobility requirements for quantum dot light emitting devices due to low mobility and high production costs, while polysilicon TFTs have poor uniformity and high temperature processes, limiting their application in large-size displays. Additionally, silicon-based semiconductors face challenges with short channel effects and doping fluctuations, necessitating a solution to enhance transistor mobility for improved display luminescence.

Innovation Solution

A method is developed to fabricate thin film transistors by providing a substrate with an isolating layer, coating an active layer precursor solution composed of a metal oxide and carbon nanotubes, forming an active layer thin film, and dividing it into small modules, which increases mobility and is used to drive quantum dot light emitting devices, thereby enhancing display luminescence performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If conventional amorphous silicon TFTs are used, then the manufacturing process is simple and cost is low, but the mobility is insufficient to meet quantum dot light emitting device requirements

Engineering Contradiction:
Improvemanufacturing simplicityVSAvoidtransistor mobility
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent uses a composite active layer comprising metal oxide semiconductor and carbon nanotubes. The carbon nanotubes are incorporated into the metal oxide matrix to enhance carrier mobility while maintaining the low-temperature processing advantage of metal oxide TFTs, thus resolving the contradiction between manufacturing simplicity and transistor mobility.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent changes the material composition parameters of the active layer by introducing carbon nanotubes with high intrinsic mobility (above 1000 cm²/(V·s)) into the metal oxide semiconductor. This parameter change enables the TFT to achieve mobility meeting quantum dot device requirements while preserving the simple manufacturing process of metal oxide TFTs.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If polysilicon TFTs are used, then mobility and stability are improved, but high temperature process and excessive process steps make production cost extremely high

Engineering Contradiction:
Improvetransistor mobilityVSAvoidproduction cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent changes the processing temperature parameter from high temperature (polysilicon TFTs require >800°C) to low temperature (metal oxide TFTs can be processed at <450°C). This parameter change reduces production cost and simplifies manufacturing while the carbon nanotube addition ensures mobility requirements are still met.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs a composite active layer of metal oxide and carbon nanotubes that combines the low-temperature processability of metal oxides with the high mobility of carbon nanotubes, providing a cost-effective alternative to expensive polysilicon TFTs while achieving the required mobility for quantum dot displays.

Inventive Principle:
Principle #40Composite materials

3Reliability

If polysilicon TFTs are used, then mobility is improved, but grain boundary makes poor uniformity affecting large-size display application

Engineering Contradiction:
Improvetransistor mobilityVSAvoiduniformity
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent uses metal oxide semiconductor material that forms a more homogeneous amorphous structure without grain boundaries. When combined with carbon nanotubes, this homogeneous matrix provides uniform electrical properties across large areas, resolving the uniformity issue that plagues polysilicon TFTs in large-size displays.

Inventive Principle:
Principle #33Homogeneity

4Ease of manufacture

If TAOS TFTs are used, then low current leakage, visibility, uniformity, and stability are achieved with low temperature process, but mobility is lower than polycrystalline silicon

Engineering Contradiction:
Improvelow temperature processVSAvoidtransistor mobility
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent creates a composite active layer by integrating carbon nanotubes into the metal oxide semiconductor matrix. The carbon nanotubes provide high carrier mobility pathways while the metal oxide matrix maintains low-temperature processability, low leakage current, and good stability, thus resolving the mobility limitation of conventional TAOS TFTs.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent changes the carrier transport parameter by introducing carbon nanotubes with intrinsic mobility above 1000 cm²/(V·s) into the metal oxide active layer. This parameter enhancement enables the TFT to achieve mobility comparable to or exceeding conventional materials while preserving the advantages of low-temperature processing and low leakage current.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method significantly improves the mobility of thin film transistors by integrating single-walled carbon nanotubes with metal oxides, leading to improved luminescence performance in quantum dot light emitting devices and reducing production costs, making it suitable for flexible and large-size displays.

Implementation Method 1

the active layer being made of a metal oxide and carbon nanotubes

Methodology Applied
Scientific EffectCarbon nanotubes: Carbon Nanotubes

Data Source

PatentUS10818856B2Method for fabricating thin film transistor, method for fabricating array substrate, and a display apparatus
Publication Date: 2020.10.27 SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
  • US10818856B2 patent drawing
  • US10818856B2 patent drawing
  • US10818856B2 patent drawing

AI summary

The present application provides a method for fabricating a thin film transistor, a method for fabricating an array substrate, and a display apparatus. A method for fabricating a thin film transistor including: providing a substrate; covering an isolating layer on the substrate; coating an active layer precursor solution on the isolation layer; forming an active layer thin film by the active layer precursor solution; dividing the active layer thin film into a small module active layer, the mobility of the active layer of the thin film transistor is increased, and to drive the quantum dot light emitting device of the array substrate through the thin film transistor with high mobility to improve the display luminescence performance of the display apparatus.