CNT EUV Pellicle Coating for Hydrogen Plasma Resistance
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Solution Overview
Problem
Carbon nanotube (CNT) pellicle membranes in EUV lithography are susceptible to damage from hydrogen plasma, leading to reduced lifespan and potential defects in the transferred pattern on semiconductor wafers.
Innovation Solution
A protective coating comprising transition metal-containing nanostructures encapsulated by a carbon-based diffusion barrier layer and a conformal capping layer is applied to CNTs in the pellicle membrane to shield them from hydrogen radicals and ions, enhancing durability and extending the membrane's lifespan.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If CNT pellicle membrane is used in EUV lithography, then pattern transfer is enabled, but the membrane is damaged by hydrogen plasma reducing its lifespan
Solution Approach 1:
The patent applies composite materials by creating a multi-layer protective coating structure on the CNT pellicle membrane. The coating includes a carbon-based diffusion barrier layer and a conformal capping layer, forming a composite structure that combines different material properties to simultaneously provide hydrogen plasma resistance and maintain membrane functionality.
Solution Approach 2:
The protective coating acts as an intermediary between the hydrogen plasma environment and the CNT membrane. The carbon-based diffusion barrier layer and conformal capping layer serve as mediating structures that intercept and protect the underlying CNT membrane from direct exposure to harmful hydrogen radicals and ions.
2Reliability
If protective coating is applied to CNTs, then resistance to hydrogen plasma is improved, but device complexity increases
Solution Approach 1:
The patent employs thin film structures for the protective coating, where the carbon-based diffusion barrier layer and conformal capping layer are deposited as thin conformal films on the CNT surface. This approach provides protection while minimizing the addition of structural complexity and maintaining the flexibility of the underlying CNT membrane.
Solution Approach 2:
The protective coating structure serves multiple functions simultaneously: it acts as a diffusion barrier to hydrogen, provides mechanical protection, and maintains the structural integrity of the CNT membrane. This multi-functionality reduces the need for additional separate protective components, thereby limiting the increase in device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The protective coating significantly improves the CNT pellicle membrane's resistance to hydrogen plasma, thereby extending its lifespan and maintaining pattern integrity during EUV lithography processes.
Implementation Method 1
a carbon-based diffusion barrier layer over at least the plurality of first nanostructures
Data Source
AI summary
A pellicle including a pellicle membrane with improved stability to hydrogen plasma is provided. The pellicle membrane includes a plurality of carbon nanotubes (CNTs), where at least one carbon nanotube (CNT) of the plurality of CNTs is coated by a protection coating. The protection coating includes a plurality of nanostructures that includes a transition metal or an oxide, nitride, silicide or carbide thereof on a surface of the at least one CNT of the plurality of CNTs, a carbon-based diffusion barrier layer over at least the plurality of nanostructures, and a capping layer over at least the carbon-based diffusion barrier layer. The pellicle further includes a pellicle border attached to the pellicle membrane along a peripheral region of the pellicle membrane and a pellicle frame attached to the pellicle border.