Dry Cleaning Semiconductor Containers with CO2 Snowflakes

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Solution Overview

Problem

Current cleaning methods for semiconductor containers require extensive use of liquid solvents, leading to increased consumption and longer processing times, which is inefficient and environmentally impactful.

Innovation Solution

A dry cleaning device and method utilizing carbon dioxide snowflakes for cleaning semiconductor container components, integrated with an inspection module and programmable logic controller (PLC) to determine the type of contamination and select appropriate cleaning procedures.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If liquid solvents are used for cleaning semiconductor containers, then cleaning effectiveness is achieved, but solvent consumption increases and processing time extends

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidprocessing time

Core Design Contradiction:

ReliabilityVSLoss of time

Solution Approach 1:

The patent changes the physical state of the cleaning medium from liquid to solid (carbon dioxide snowflakes), fundamentally altering the cleaning mechanism. This phase change enables direct sublimation cleaning without requiring liquid solvent immersion, drying, or baking cycles, thereby reducing processing time while maintaining cleaning effectiveness.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent utilizes the phase transition of carbon dioxide from gas to solid (snowflake formation) and back to gas during the cleaning process. The CO2 snowflakes physically adhere to contaminants and transfer away from the container surface, enabling effective cleaning without the time-consuming liquid solvent evaporation and drying processes.

Inventive Principle:

Principle #36Phase transitions

2Reliability

If liquid solvents are used for cleaning semiconductor containers, then cleaning effectiveness is achieved, but waste water production increases

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidwaste water production

Core Design Contradiction:

ReliabilityVSLoss of substance

Solution Approach 1:

The patent replaces the chemical-mechanical liquid solvent cleaning system with a physical phase-change based cleaning system. Carbon dioxide snowflakes provide mechanical adhesion and transfer of contaminants through sublimation, eliminating the need for liquid solvents and subsequent waste water disposal infrastructure.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent employs carbon dioxide, an inert gas, as the cleaning medium. This inert environment prevents chemical reactions with the container and contaminants, allowing for clean removal of contaminants without the environmental and waste management issues associated with liquid solvents and waste water.

Inventive Principle:

Principle #39Inert atmosphere (Inert environment)

3Reliability

If multiple washing, drying, and baking processes are performed, then cleaning thoroughness is improved, but processing time increases

Engineering Contradiction:

Improvecleaning thoroughnessVSAvoidprocessing efficiency

Core Design Contradiction:

ReliabilityVSProductivity

Solution Approach 1:

The patent merges the washing, drying, and baking functions into a single integrated cleaning cycle using carbon dioxide snowflakes. The phase-change mechanism simultaneously achieves contaminant removal (washing), solvent evaporation (drying), and thermal processing (baking) in one operation, eliminating the need for sequential multi-step processing.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The patent implements continuous cleaning action through the sustained phase transition of carbon dioxide snowflakes. The CO2 continuously sublimates and transfers heat and cleaning action throughout the process, maintaining effective cleaning throughout the cycle without requiring interruptions for draining, drying, or baking stages.

Inventive Principle:

Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The dry cleaning device effectively cleans semiconductor container components without using liquid solvents, reducing processing time and solvent consumption, and minimizing waste water production, while enhancing the quality and efficiency of the cleaning process.

Implementation Method 1

cleaning the container component by carbon dioxide snowflakes

Methodology Applied

Scientific EffectSublimation: Sublimation

Implementation Method 2

cleaning the container component by carbon dioxide snowflakes

Methodology Applied

Scientific EffectDeposition: Deposition (physical)

Data Source

PatentUS20250065380A1Dry cleaning device and dry cleaning method

Publication Date: 2025.02.27 GUDENG PRECISION IND CO LTD

AI summary

A dry cleaning device adapted to clean a container component of a container of a semiconductor manufacturing process and adapted to clean the container component by carbon dioxide snowflakes. The dry cleaning device can first inspect the container component before and after cleaning, clean the container component by carbon dioxide snowflakes according to a predetermined cleaning working set, and forwards the container component to a next workstation once the cleaning of the container component is complete. The dry cleaning device is adapted to clean a container of a semiconductor manufacturing process in a fast and effective manner without involving any liquid solvents.